Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 1999.11a
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- Pages.70-70
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- 1999
Parametric Study of Dry Etching of Doped GaN in Chlorine-Based Inductively Coupled Plasmas
$Cl_2$ -ICP를 이용한 Doped GaN 식각의 공정변수적 연구
- Im, Y.H. (School of Chemical Engineering & Technology, Chonbuk National University) ;
- Cho, B.C. (School of Chemical Engineering & Technology, Chonbuk National University) ;
- Park, J.S. (School of Chemical Engineering & Technology, Chonbuk National University) ;
- Hahn, Y.B. (School of Chemical Engineering & Technology, Chonbuk National University) ;
- Hong, J. (Samsung Semiconductors R &D Center) ;
- Pearton, S.J. (Department of Materials Science & Engineering, University of Florida)
- Published : 1999.11.01
Abstract
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