Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 1999.11a
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- Pages.69-69
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- 1999
Selective Dry Etching of InN/AlN/GaN System in $Cl_2$ -, ICl- and IBr-Based Inductively Coupled Plasmas
$Cl_2$ , ICl 및 IBr 유도병합 플라즈마를 이용한 InN/AlN/GaN 계의 선택적 식각
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Hahn, Y.B.
(School of Chemical Engineering & Technology, Chonbuk National University) ;
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Im, Y.H.
(School of Chemical Engineering & Technology, Chonbuk National University) ;
- Cho, B.C. (School of Chemical Engineering & Technology, Chonbuk National University) ;
- Park, J.S. (School of Chemical Engineering & Technology, Chonbuk National University) ;
- Hong, J. (Samsung Semiconductors R &D Center) ;
- Pearton, S.J. (Department of Materials Science & Engineering, University of Florida)
- Published : 1999.11.01
Abstract
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