한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 1999년도 제17회 학술발표회 논문개요집
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- Pages.216-216
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- 1999
The advancing techniques and sputtering effects of oxide films fabricated by Stationary Plasma Thruster (SPT) with Ar and $O_2$ gases
- Jung Cho (Thin Film Technology Research Center, Korea Institute of Science and Technology) ;
- Yury Ermakov (Thin Film Technology Research Center, Korea Institute of Science and Technology) ;
- Yoon, Ki-Hyun (Department of Ceramic Engineering, Yonsei University) ;
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Koh, Seok-Keun
(Thin Film Technology Research Center, Korea Institute of Science and Technology)
- 발행 : 1999.07.01
초록
The usage of a stationary plasma thruster (SPT) ion source, invented previously for space application in Russia, in experiments with surface modifications and film deposition systems is reported here. Plasma in the SPT is formed and accelerated in electric discharge taking place in the crossed axial electric and radial magnetic fields. Brief description of the construction of specific model of SPT used in the experiments is presented. With gas flow rate 39ml/min, ion current distributions at several distances from the source are obtained. These was equal to 1~3 mA/
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