한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 1999년도 제17회 학술발표회 논문개요집
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- Pages.123-123
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- 1999
The Effect of Plasma Power on the Composition and Microhardness of a-SiC:H Films Grown by PECVD
- Lee, Young-Ku-K (Advanced Materials Division Korea Research Institute of Chemical Technology) ;
- Kim, Yunsoo (Advanced Materials Division Korea Research Institute of Chemical Technology)
- 발행 : 1999.07.01
초록
Amorphous hydrogenated silicon carbide (a-SiC:H) films were deposited at the temperature of 40
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