Characteristic Estimation of the Formation and Etching of PZT Thin Films for Pyroelectric IR Sensor Application

초전형 적외선 센서 제작을 위한 PZT박막 형성 및 식각 특성 평가

  • Park, Y.K. (Dept. of Electronics Eng., The University of Seoul) ;
  • Ju, B.K. (Electronic Materials and Devices Research Center, KIST) ;
  • Jeon, H.S. (Dept. of Electronics Eng., The University of Seoul) ;
  • Yoon, Y.S. (Thin Film Technology Research Center, KIST) ;
  • Oh, Y.J. (Thin Film Technology Research Center, KIST) ;
  • Lee, Y.H. (Electronic Materials and Devices Research Center, KIST) ;
  • Suh, S.H. (Electronic Materials and Devices Research Center, KIST) ;
  • Oh, M.H. (Electronic Materials and Devices Research Center, KIST) ;
  • Kim, C.J. (Dept. of Electronics Eng., The University of Seoul)
  • 박윤권 (서울시립대학교 전자전기공학부) ;
  • 주병권 (한국과학기술연구원 정보재료소자 연구센터) ;
  • 전호승 (서울시립대학교 전자전기공학부) ;
  • 윤영수 (한국과학기술연구원 박막기술 연구센터) ;
  • 오영제 (한국과학기술연구원 박막기술 연구센터) ;
  • 이윤희 (한국과학기술연구원 정보재료소자 연구센터) ;
  • 서상희 (한국과학기술연구원 정보재료소자 연구센터) ;
  • 오명환 (한국과학기술연구원 정보재료소자 연구센터) ;
  • 김철주 (서울시립대학교 전자전기공학부)
  • Published : 1999.07.19

Abstract

In this study, we used the sputtering method with single target to obtain the thick and uniform PZT($PbZrTiO_3$) films for micromached IR sensor application. Then, we investigated the etching characteristics and conditions which is necessary process to fabricate the IR sensor. We tested the C-axis orientation and P-E loop of the deposited PZT films with the XRD and RT66A, respectively. Also we investigated the surface of the films by the AFM and SEM analysis.

Keywords