The Effect of Gas Pressure on the c-axis Orientation Properties of Co-Cr Thin Film prepared by Sputtering Method

스퍼터링법으로 제작된 Co-Cr 박막에서 가스 압력이 c-축 배향성에 미치는 영향

In this paper, Co-Cr thin films which are known for a excellent perpendicular magnetic recording media were prepared. Changing target- substrate distance, Ar gas pressure and arriving atoms, the incident angle and c-axis orientation properties by using the facing targets sputtering system. We evaluated the c-axis dispersion angle by measu ring half-height width with Micro area X-Ray Diffractometer, measured the thickness of thin film with Ellipsometer. The magnetic properties were compared measuring in-plane squareness and perpendicular coercivity with vibrating sample Magnetometer.