$Sr_2(Nb,Ta)_2O_7$ Thin Films for Ferroelectric Gate Field Effect Transistor.

Ferroelectric Gate Field Effect Transistor용 $Sr_2(Nb,Ta)_2O_7$박막

  • 김창영 (영남대학교 재료금속 공학부) ;
  • 우동찬 (영남대학교 재료금속 공학부) ;
  • 이희영 (영남대학교 재료금속 공학부) ;
  • 이원재 (한국전자통신 연구원)
  • Published : 1998.11.01

Abstract

Ferroelectric Sr$_2$(Nb,Ta)$_2$O$_{7}$ (SNTO) thin films were prepared by chemical solution deposition processes. SNTO thin films were spin-coated on Pt/Ti/SiO$_2$/(100)Si substrates. After multiple coating, dried thin films were heat-treated for decomposition of residual organics and crystallization. B site-rich impurity phase, i.e. [Sr(Nb,Ta)$_2$O$_{6}$], was found after annealing, where its appearance was dependent on process temperature indicating the possible reaction with substrate. Dielectric and other relevant electrical properties were measured and the results showed a little possibility in ferroelectric gate random access memory devices.s.s.

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