Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 1998.08a
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- Pages.79.2-79
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- 1998
CHARACTERISTICS OF Ir ETCHING FOR $0.20\mu\textrm{m}$ PATTERN
- Park, B.J. (Semiconductor Research Div. Hyundai electronics industries.) ;
- Shin, H.S. (Semiconductor Research Div. Hyundai electronics industries.) ;
- Kim, J.W. (Semiconductor Research Div. Hyundai electronics industries.) ;
- Seol, Y.S. (Semiconductor Research Div. Hyundai electronics industries.) ;
- Lee, D.H. (Semiconductor Research Div. Hyundai electronics industries.) ;
- Cho, Y.K. (Tegal Corp.)
- Published : 1998.08.01
Abstract
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