INTERFICAL REACTION OF METAL THIN FILMS ON ION IMPLANTATED SILICON UNDER HIGH CURRENT DENSITY

  • Lin, H.H. (Department of Materials Science and Engineering, National Tsing Hua University) ;
  • Chen, K.N. (Department of Materials Science and Engineering, National Tsing Hua University) ;
  • Cheng, S.L. (Department of Materials Science and Engineering, National Tsing Hua University) ;
  • Chen, L.J. (Department of Materials Science and Engineering, National Tsing Hua University)
  • Published : 1998.08.01