Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 1998.08a
- /
- Pages.69.3-69
- /
- 1998
INTERFICAL REACTION OF METAL THIN FILMS ON ION IMPLANTATED SILICON UNDER HIGH CURRENT DENSITY
- Lin, H.H. (Department of Materials Science and Engineering, National Tsing Hua University) ;
- Chen, K.N. (Department of Materials Science and Engineering, National Tsing Hua University) ;
- Cheng, S.L. (Department of Materials Science and Engineering, National Tsing Hua University) ;
- Chen, L.J. (Department of Materials Science and Engineering, National Tsing Hua University)
- Published : 1998.08.01
Abstract
Keywords