Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 1998.08a
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- Pages.106.1-106
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- 1998
AN OPTIMIZED NITRIDE RESIDUE PHENOMENA OF SHALLOW TRENCH ISOLATION (STI) PROCESS BY CHEMICAL MECHANICAL POLISHING (CMP)
- Kim, Sang-Y. (Dept. of Elect. Eng, Chungang Univ.) ;
- Kim, C.I. (Dept. of Elect. Eng, Chungang Univ.) ;
- Chang, E.G. (Dept. of Elect. Eng, Chungang Univ.) ;
- Seo, Y.I. (School of Elect. Eng. Daebool Univ.) ;
- Kim, T.H. (Dept. of Elect. Yeojoo Technical Collage) ;
- Lee, W.S. (Dept. of Elect. Eng, Chosun Univ.)
- Published : 1998.08.01
Abstract
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