Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 1998.08a
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- Pages.104.2-104
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- 1998
ATOMIC LAYER DEPOSITION OF Ti-Si-N THIN FILMS BY SEQUENTIAL INTRODUCTION OF $TiCl_4,{\;}SiH_4$ AND $NH_3$
- Min, Jae-Sik (Dept. of Mat. Sci. & Eng.. KAIST) ;
- Kang, Sang-Won (Dept. of Mat. Sci. & Eng.. KAIST) ;
- Lee, Chun-Su (GeniTech. Inc)
- Published : 1998.08.01
Abstract
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