Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 1998.02a
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- Pages.68-69
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- 1998
Formation of Silicon nanocrystallites by ion beam assisted electron beam deposition
- Won Chel Choi (Semiconductor Materials Laboratory Korea Institute of Science and Technology pp.O.Box 131 Cheongryang)
- Published : 1998.02.01
Abstract
Nano-crystalline silicon(nc-Si) thin films were directly depposited by ion beam assisted electron beam depposition (IBAED) method. The visibe luminescence in IBAED sampples were originated from not an oxygen bond but Si nano-crystallites. And we can conclude that the ion beam would be contribute to the suppression of the Si-O bond formation.
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