한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 1998년도 제16회 학술발표회 논문개요집
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- Pages.93-93
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- 1998
The improvement of Pt adhesion to silicon wafer using ultra thin Ti metal interlayer modified by $N_2$ Ion beam irradiation
- Cho, Jung-Cho (Thin Film Technology Research Center, Korea Institute of Science technology) ;
- Choi, Won-Kook (Thin Film Technology Research Center, Korea Institute of Science technology) ;
- Yoon, Ki-Hyun (Deppartment of Ceramic Engineering, Yonsei University) ;
- Jung, Hyung-Jin (Thin Film Technology Research Center, Korea Institute of Science technology) ;
- Krakina, Elena (Plasma Tech Co. Ltd) ;
- Koh, Seok-Keun (Thin Film Technology Research Center, Korea Institute of Science technology)
- 발행 : 1998.06.01