Effect of Ion beam Potential on Structural and Electrical Propperties of $In_2O_3$ film in Reactive Ion-Assisted Depposition

  • Cho, Jun-Sik-Cho (Thin Film Technology Research Center, Korea Institute of Science and Technology, Cheongryang) ;
  • Yoon, Ki-Hyun-Yoon (Department of Ceramics Engineering, Yonsei University) ;
  • Choi, Won-Kook-Choi (Thin Film Technology Research Center, Korea Institute of Science and Technology, Cheongryang) ;
  • Jung, Hyung-Jin-Jung (Thin Film Technology Research Center, Korea Institute of Science and Technology, Cheongryang) ;
  • Kondranin, Serguei-Kondranin (Plasma Tech Co., Ltd) ;
  • Koh, Seok-Keun (Thin Film Technology Research Center, Korea Institute of Science and Technology, Cheongryang)
  • 발행 : 1998.06.01