Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 1998.07d
- /
- Pages.1343-1345
- /
- 1998
Nanometer Scale Vacuum Lithography using Plasma Processes
플라즈마 공정을 이용한 나노미터 단위의 진공리소그래피
- Kim, S.O. (Inha Univ.) ;
- Park, B.K. (Howon Univ.) ;
- Park, J.k. (Howon Univ.) ;
- Lee, K.S. (Dongshin Univ.) ;
-
Lee, J.
(Mokpo National Univ.)
;
- Yuk, J.H. (Yuhan College) ;
- Ra, D.K. (Mokpo Science College) ;
- Lee, D.C. (Inha Univ.)
- 김성오 (인하대 전기공학과) ;
- 박복기 (호원대 전기공학과) ;
- 박진교 (호원대 전기공학과) ;
- 이경섭 (동신대 전기공학과) ;
-
이진
(목포대 전기공학과)
;
- 육재호 (유한대 전기과) ;
- 나동근 (목포과학대 전기과) ;
- 이덕출 (인하대 전기공학과)
- Published : 1998.07.20
Abstract
This work was carried out to develop a pattern on the nanometer scale using plasma polymerization and plasma etching. This study is also aimed at developing a resist for the nano process and a vacuum lithography process. The thin films of plasma polymerization were fabricated by the plasma polymerization of inter-electrode capacitively coupled gas flow system. After delineating the pattern at accelerating voltage of 30[kV], ranging the dose of
Keywords