대한전기학회:학술대회논문집 (Proceedings of the KIEE Conference)
- 대한전기학회 1998년도 하계학술대회 논문집 D
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- Pages.1288-1290
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- 1998
$SiH_2Cl_2-H_2-HCl$ 시스템에서의 실리콘 선택적 성장에 대한 표면 반응메커니즘 고찰
A Study on the Reaction Mechanism of Selective Epitaxial Growth in $SiH_2Cl_2-H_2-HCl$ System
- Kim, Bong-Soo (Dept. of Electrical Engineering, Korea University) ;
- Han, Seung-Oh (Dept. of Electrical Engineering, Korea University) ;
- Pak, James Jung-Ho (Dept. of Electrical Engineering, Korea University)
- 발행 : 1998.07.20
초록
Three most dominant reactions are adsorption, movement, and desorption of
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