헬리칼 공명 플라즈마의 기판플라즈마밀도에 미치는 축방향자계의 영향

Influence of axial magnetic field on the plasma density on the substrate in helical resonator

Plasma density and its axial distribution and uniformity on the substrate in a helical resonator plasma in the external magnetic field have been measured using Langmuir probes. Net RF power is set to 200W and chamber pressure is varied from $1{\times}10^{-1}Torr$ to $1{\times}10^{-4}Torr$. There are three kinds of external magnetic field structure applied on the helical resonator plasma. One is a uniform magnetic field, another is a plus gradient magnetic field and the third is a minus gradient magnetic field. Of the three magnetic field structure, the minus gradient magnetic field is found to show the highest increase in plasma density on the substrate compared with other magnetic structures. In order to avoid radial density ununiformity, weak magnetic fields under 100Gauss are applied.