The structure of the Si-$SiO_2$ interface formed by oxygen ion beam bombardment and high tempperature annealing

  • Kim, Young-Pil (Department of Materials Science and Engineering Korea Advanced Institute of Science and Technology) ;
  • Choi, Si-Kyung (Department of Materials Science and Engineering Korea Advanced Institute of Science and Technology) ;
  • Kim, Hyung-Kyong (Korea Research Institute of Standards and Science) ;
  • Moon, Dae-Won (Korea Research Institute of Standards and Science)
  • Published : 1997.02.01