Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 1997.02a
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- Pages.70-70
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- 1997
In Situ Dry Etching pprocesses for Moly Multi-Layers with application to the Reduced Process-Less Mask TFT
- Hong, Hong-Munppyo (AMLCD Division, Samsung electronics Co., Ltd., Kiheung, Kyungkido 449-900) ;
- Kim, Kim-Sanggab (AMLCD Division, Samsung electronics Co., Ltd., Kiheung, Kyungkido 449-900) ;
- Yu, Yu-Chungi (AMLCD Division, Samsung electronics Co., Ltd., Kiheung, Kyungkido 449-900) ;
- Cho, Cho-Seongyun (AMLCD Division, Samsung electronics Co., Ltd., Kiheung, Kyungkido 449-900) ;
- Kim, Kim-Jangsoo (AMLCD Division, Samsung electronics Co., Ltd., Kiheung, Kyungkido 449-900) ;
- Kim, Kim-Chiwoo (AMLCD Division, Samsung electronics Co., Ltd., Kiheung, Kyungkido 449-900) ;
- Yang, Yang-Honggun (AMLCD Division, Samsung electronics Co., Ltd., Kiheung, Kyungkido 449-900) ;
- Souk, Joon-Yung (AMLCD Division, Samsung electronics Co., Ltd., Kiheung, Kyungkido 449-900)
- Published : 1997.02.01
Abstract
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