한국결정성장학회:학술대회논문집 (Proceedings of the Korea Association of Crystal Growth Conference)
- 한국결정성장학회 1997년도 Proceedings of the 12th KACG Technical Meeting and the 4th Korea-Japan EMGS (Electronic Materials Growth Symposium)
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- Pages.275-280
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- 1997
The Effect of Chamber Pressure and Nitrogen Flow Rate on Deposition Characteristics of $(Ni_{0.8}Fe_{0.2})_{20}Ag_{80}$ Thin Films
- Oh, T.S. (Department of Material Science & Engineering, KAIST) ;
- Choo, W.K. (Department of Material Science & Engineering, KAIST)
- 발행 : 1997.06.01
초록
We have investigated the deposition characteristics of (Ni0.8Fe0.2)20Ag80 thin films as a function of chamber pressure and nitrogen flow rate with scanning electron microscopy(SEM), atomic force microscopy(AFM), XRD and
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