Characterization of Multiphase in $Fe_2O_3$ Thin Film by PECVD

  • Kim, Bum-Jin (Department of Material Engineering, Chungbuk National University) ;
  • Lee, Eun-Tae (Department of Material Engineering, Chungbuk National University) ;
  • Jang, Gun-Eik (Department of Material Engineering, Chungbuk National University) ;
  • Chung, Yong-Sun (Ceramic Materials Research Institute, Han Yang University)
  • 발행 : 1997.06.01

초록

Fe$_2$O$_3$ thin films were prepared on $Al_2$O$_3$ substrate by PECVD(Plasma-Enhanced Chemical Vapor Deposition) process. The phase transformation of iron oxide film was determined as the substrate temperature and reduction-oxidation process. $\alpha$-Fe$_2$O$_3$ was stable in deposition temperature ranges of 80~15$0^{\circ}C$. Fe$_3$O$_4$ phase was obtained by the reduction process of $\alpha$-Fe$_2$O$_3$ phase in H$_2$ ambient. Fe$_3$O$_4$ phase was transformed into a ${\gamma}$-Fe$_2$O$_3$ thin film under controlled oxidation conditions at 280~30$0^{\circ}C$.

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