Some Characteristics of Ion Beam Source for $\gamma$-Coefficient Measurement of MgO Thin Film

MgO 박막의 $\gamma$ 계수 측정용 이온빔원의 시작 및 동작특성

  • Jeong, Shin-Soo (Pusan National Univ. Electrical Engineering Dept.) ;
  • Kim, Jun-Ho (Pusan National Univ. Electrical Engineering Dept.) ;
  • Kim, Hee-Je (Pusan National Univ. Electrical Engineering Dept.) ;
  • Cho, Jung-Soo (Pusan National Univ. Electrical Engineering Dept.) ;
  • Park, Chung-Hoo (Pusan National Univ. Electrical Engineering Dept.) ;
  • Park, Cha-Soo (Pusan National Univ. Electrical Engineering Dept.)
  • Published : 1997.07.21

Abstract

The Kaufman type ion beam source with focusing lens was prepared to measure $\gamma$-coefficient of MgO thin film. Initial discharge of the system was started with the discharge voltage of 25V, the cathode filament current of 5.5A at the constant magnetic field of 150G. The system shows the maximum ion current density of $120{\mu}A/cm^2$, energy dispersion of 200eV and beam divergence of $30^{\circ}$ under the condition of Ar gas pressure $2.5{\times}10^{-4}Torr$, the beam voltage of 500V, the discharge voltage of 90V, the accelerator voltage of -200V and the cathode filament current of 6.1A. When the focusing lens was installed onto the ion beam source, the spreadness diameter of ion beam was about 10mm.

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