Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 1996.11a
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- Pages.42-42
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- 1996
Characterization of $Al(CH_3)_3$ films grown by atomic layer epitaxy using $Al_2O_3$ as Al-precursor
Atomic Layer Epitaxy 방법으로 $Al(CH_3)_3$ 을 사용하여 성장한 $Al_2O_3$ 박막의 특성연구
Abstract
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