Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 1996.05a
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- Pages.40-40
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- 1996
The applicability as an antireflective layer of $TiO_x$ thin film in DUV lithography
DUV 리소그라피공정에서 $TiO_x$ 박막의 무반사층으로의 응용성
Abstract
Keywords