Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 1996.11a
- /
- Pages.150-150
- /
- 1996
Reactive ion etching mechanism of $RuO_2$ thin films in $O_2/CF_4$ electron cyclotron resonance plasma
$O_2/CF_4$ ECR 플라즈마를 이용한 $RuO_2$ 박막의 건식식각 기구 연구
Abstract
Keywords