한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)

한국전기전자재료학회 (The Korean Institute of Electrical and Electronic Material Engineers)
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크롬 박막 스트레인 게이지의 제작

The Fabrication of Chromium Thin-Film Strain Gauges

  • 양지영 (동서대학교 전자기계공학부) ;
  • 정현석 (동서대학교 응용공학부) ;
  • 장영석 (경남전문대학 기계설계과) ;
  • 정귀상 (동서대학교 전자기계공학부)
  • 발행 : 1996.11.01
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초록

This paper presents the basic characteristics of thin-film strain gauges using Cr thin-films, in which the Cr thin-films were deposited by DC magnetron sputtering. The optimized deposition conditions as a strain gauge were the input DC power was 7 W/$\textrm{cm}^2$ and the Ar vacuuming pressure was 9 mTorr. The characteristics of fabricated Cr thin-film strain gauge were the gauge factor(GF) was 5.86 in longitudinal strain and -2.04 in transverse one, the TCR was under 400 ppm/$^{\circ}C$ and the TCS was around 0 ppm/$^{\circ}C$.

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