Cu films by partially ionized beam deposition for furture ULSI metallization

  • Kim, Ki-Hwan (Department of Ceramics, Yonsei university) ;
  • Choi, Doo-Jin (Department of Ceramics, Yonsei university) ;
  • Han, Sung (Division of Ceramics, Korea Institute of Science and Technology) ;
  • Jang, Hong-Gui (Division of Ceramics, Korea Institute of Science and Technology) ;
  • Jung, Hyung-Jin (Division of Ceramics, Korea Institute of Science and Technology)
  • Published : 1996.06.01