Study on the Residue Film Induced by Magnetically-Enhanced Reactive Ion Etching of Al(Si,Cu) Film Using the Mixture of $BCl_3,Cl_2 and N_2$ Gases

  • Yun, Sun-Jin (Semiconductor Technology Division, Electronics and Telecommunications Research Institute) ;
  • Kwon, Kwang-Ho (Semiconductor Technology Division, Electronics and Telecommunications Research Institute) ;
  • Kim, Chang-Il (Department of Electrical Engineering, Hanseo University) ;
  • Lee, Joong-Whan (Department of Electronic Engineering, Anyang University) ;
  • Nam, Kee-Soo (Semiconductor Technology Division, Electronics and Telecommunications Research Institute)
  • Published : 1996.02.01