대한전기학회:학술대회논문집 (Proceedings of the KIEE Conference)
- 대한전기학회 1996년도 하계학술대회 논문집 C
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- Pages.1838-1840
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- 1996
평판형 전극계의 RF 글로우 방전특성 및 TiN 박막특성
RF Glow Discharge and TiN Thin Film Characteristics in a Plane Electrode System
- Kwak, D.J. (Kyungsung University) ;
- Kim, D.H. (Pusan University) ;
- Kim, H.J. (Pusan University) ;
- Park, C.H. (Pusan University)
- 발행 : 1996.07.22
초록
In order to study the relationship between the physical properties of glow discharge plasma and the physical behavior of TiN thin film, electrical characteristics of RF discharge plasma driven at 13.56MHz in a parallel-plate electrode system were measured. Plasma parameters, such as electron density and temperature, are also studied since they may be considered as one of the very important factors deciding the physical properties of TiN thin film under given conditions of applied biasd voltage and pressure. The TiN thin film were fabricated over a wide range of discharge conditions, and some of the general relationships between the measured plasma parameters and the properties of TiN thin film were discussed.
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