대한전기학회:학술대회논문집 (Proceedings of the KIEE Conference)
- 대한전기학회 1996년도 하계학술대회 논문집 C
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- Pages.1492-1494
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- 1996
반도체 제조용 PCVD 반응기에서의 미립자 오염
Particle Contamination in PCVD Reactor for Semiconductor Processing
- Kim, Dong-Joo (Department of Chemical Engineering, Kangwon National University.) ;
- Kim, Kyo-Seon (Department of Chemical Engineering, Kangwon National University.)
- 발행 : 1996.07.22
초록
We have studied the generation, growth and behavior of chemical species and particles in silane PCVD. We included the plasma chemistry of silane, particle nucleation by homogeneous formation, acrosol dynamics and transport phenomena of chemical species and particles. The concentration profile of chemical species and particles were shown as a function of reactor length. The effects of process variables such as reactor pressure, total gas flow rate and electrical field strength on the behavior of chemical species and particles were analyzed.
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