Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 1995.11a
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- Pages.36-36
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- 1995
The Properties of Plasma CVD Titanium Nitride thin film using $N_{2}/H_{2}$ mixing gas
$N_{2}/H_{2}$ 혼합가스를 사용한 Plasma CVD Titanium Nitride 박막의 특성
Abstract
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