Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 1995.06a
- /
- Pages.149-149
- /
- 1995
Effect of Si,Ge Pre-impplant induced Defects on Electrical Properties of $P^+$ -n Junctions during Rapid Thermal Annealing
- Kim, K.I. (Electronic device & system research Lab. Research Institute of Industrial Science & Technology pp.O.Box 135, ppohang, 790-600) ;
- Kwon, Y.K. (Electronic device & system research Lab. Research Institute of Industrial Science & Technology pp.O.Box 135, ppohang, 790-600) ;
- Cho, W.J. (Advanced pprocess Tech. Deppt. LG Semicon) ;
- H. Kuwano (Department of Electrical Engineering, Faculty of Science and Technology, Keto University)
- Published : 1995.06.01
Abstract
Keywords