Oxygen Ion Beam Induced Abnormal Topographic Development at the Ta/Si Interface Studied by SIMS, XPS, and AFM

  • Kim, K.J (Surface Analysis Groupp, Korea Res. Inst. of Standards and Science) ;
  • Moon, D.W (Surface Analysis Groupp, Korea Res. Inst. of Standards and Science) ;
  • Jeon, I.C. (Dept.of Chemical, Chonbuk National University)
  • 발행 : 1995.06.01