한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 1995년도 제9회 학술발표회 논문개요집
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- Pages.24-24
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- 1995
Comparison of $Si/SiO_2$ Interface Formed by Remote Plasma Enhanced Chemical Vapor Deposition and Thermal Oxidation
- Park, Young-Bae (Laboratory for Advanced Materials Processing) ;
- XialdongLi (Department of Metals and TEchnology, Harbin Institute of Technology) ;
- Rhee, Shi-Woo (Laboratory for Advanced Materials Processing)
- 발행 : 1995.06.01