Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 1995.02a
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- Pages.23-23
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- 1995
The characterization of metallic contaminations on dielectric film surface treated with CMP and cleaning Process by TRXFR
TRXRF에 의한 CMP 및 세척 공정 후의 표면오염분석
Abstract
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