Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
권호 표지

Preparation and Magnetic Properties of Co-system Amorphous Thin Film by the Sputter method

스파터법에 의한 Co-계 비정질박막의 제작과 자기특성

  • 임재근 (명지대학교 전자공학과) ;
  • 문현욱 (명지대학교 전자공학과) ;
  • 서강수 (명지대학교 전자공학과) ;
  • 신용진 (명지대학교 전자공학과)
  • Published : 1994.11.01

⟨ Previous Next ⟩

Abstract

In this paper, We study on the fabrication of amorphous this film of zeromagnetostriction material and the magnetic properties. This films are fabricated by using sputtering method with input power of 400∼607[W], Ar gas pressure of 3∼ 9[mTorr] and target composition of Fe$\sub$4.7/ Co$\sub$74.3/Si$_2$B$\sub$19/. Sample this films with diameter of 14[mm ] and thickness of 27-30[$\mu\textrm{m}$] were obtained through experiments. When we analyzed the magnetic properties before and after annealing with sample thin films, we confirmed that magnetic domain wall amorphous thin films consisted for Neel magnetic domain wall with the width of about 1[$\mu\textrm{m}$].

Keywords