HYDROGEN PLASMA DURABILITY OF $SnO_2$:F FILMS

불소 도핑 이산화주석 박막의 수소플라즈마 내구성

Fluorine-doped ($SnO_2$:F) thin films obtained by pyrosol deposition method have been exposed to R.F. excited pure hydrogen plasma under the following conditions; substrate temperature of 200$^{\circ}C$, $H_2$ pressure of 1 Torr, R.F. input power of 50 mW/$\textrm{cm}^{2}$, $H_2$ flow rate of 30cc/min and exposure time of 15-600 seconds. It is found that the sheet resistance of the films remains unchanged or rather slightly reduces for initial exposure time of 30-60 seconds, but increases sharply with further increasing the exposure time. The optical transmittance of $SnO_2$:F films slows a rapid fall with increasing exposure time except for a film obtained with a solution having $CH_3OH/H_2O$ mol ratio of 2.65, its degradations at the exposure time of 30-60 seconds are about 7-15%. In addition, the exposure of the films to hydrogen plasma atmosphere leads to remarkable changes in the microstructure and chemical composition, which should be attributed to the reduction of $SnO_2$ to SnO and to elemental Sn.