Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 1991.11a
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- Pages.265-268
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- 1991
A study on the formation and properties of TMDSO/$O_2$ thin film by the RF Plasma CVD
RF Plasma CVD에 의한 TMDSO/$O_2$ 의 합성과 박막의 특성에 관한 연구
Abstract
In the study, PPTMDSO(plasma-polymerized tetramethyldisiloxane) films were deposited on on glass substrate in a paralled plate reactor. As the function of RF power increased from 20 W to 110 W, and the substrate temperature increased from
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