Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 1990.10a
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- Pages.81-85
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- 1990
Electrical Properties of Annealed $WSi_{x}$ Films Deposited on P+ Polysilicon by LPCVD
P+ Polysilicon층 위에 저압화학증착된 $WSi_{x}$ 박막의 열처리에 따른 전기적 특성
Abstract
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