Design of Thin solid Film Systems for Nd High Power Laser and Sol-gel Coating Experiment

Thin solid film systems polarizing beam splitter and disk amplifier used in the high power laser system ({{{{ lambda }}0=1060nm) are designed by computer aided optimization technique. Extinction ratio of designed polarizing beam splitter for incidence angle 30$^{\circ}$, 45$^{\circ}$, 55.60$^{\circ}$ are 1:93, 1:895, 1:1991. respectively. Maximum reflectance of designed thin film system of disk amplifier is less than 3% for pumping band (500-900nm) and 0.15% for laser beam. Further, SiO film chosen as one of the suitable thin films in the high power laser system is prepared by the sol=-gel process which gives high damage threshold. When the withdrawal speed is 6.15cm/min -16.62 cm/min and the mixing ratio is in the range of 1 mol (ethylsilicate): 4-8mol(ethylalcohol) : 2mol(water), the thickness of deposited film is in the range of 500{{{{ ANGSTROM }}-1500{{{{ ANGSTROM }}.