• Title, Summary, Keyword: Ru

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Highly-conformal Ru Thin Films by Atomic Layer Deposition Using Novel Zero-valent Ru Metallorganic Precursors and $O_2$ for Nano-scale Devices

  • Kim, Su-Hyeon
    • Electrical & Electronic Materials
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    • v.28 no.2
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    • pp.25-33
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    • 2015
  • Ruthenium (Ru) thin films were grown on thermally-grown $SiO_2$ substrates by atomic layer deposition (ALD) using a sequential supply of four kinds of novel zero-valent Ru precursors, isopropyl-methylbenzene-cyclohexadiene Ru(0) (IMBCHDRu, $C_{16}H_{22}Ru$), ethylbenzen-cyclohexadiene Ru(0) (EBCHDRu, $C_{14}H_{18}Ru$), ethylbenzen-ethyl-cyclohexadiene Ru(0) (EBECHDRu, $C_{16}H_{22}Ru$), and (ethylbenzene)(1,3-butadiene)Ru(0) (EBBDRu, $C_{12}H_{16}Ru$) and molecular oxygen (O2) as a reactant at substrate temperatures ranging from 140 to $350^{\circ}C$. It was shown that little incubation cycles were observed for ALD-Ru processes using these new novel zero-valent Ru precursors, indicating of the improved nucleation as compared to the use of typical higher-valent Ru precursors such as cyclopentadienyl-based Ru (II) or ${\beta}$-diketonate Ru (III) metallorganic precursors. It was also shown that Ru nuclei were formed after very short cycles (only 3 ALD cycles) and the maximum nuclei densities were almost 2 order of magnitude higher than that obtained using higher-valent Ru precursors. The step coverage of ALD-Ru was excellent, around 100% at on a hole-type contact with an ultra-high aspect ratio (~32) and ultra-small trench with an aspect ratio of ~ 4.5 (top-opening diameter: ~ 25 nm). The developed ALD-Ru film was successfully used as a seed layer for Cu electroplating.

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Properties of sputtering PZT thin film on the Ru/$RuO_2$electrode (Ru/$RuO_2$전극에 성장한 PZT박막의 특성에 관한연구)

  • 강현일;최장현;이종덕;송준태
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • pp.717-720
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    • 2001
  • Ferroelectric lead ziroconate titanate (PZT) thin film were fabricated on the different bottom electrodes. Both Ru and Ru/RuO$_2$bottom electrodes were deposited by RF-magnetron sputteirng method. The structure phase and surface morphology of the PZT thin film were largely affected by the bottom electrode. It was observerd that used of Ru/RuO$_2$double electrode reduced leakage current and better ferroelectric properties compare with RuO$_2$bottom electrode. From these results, Ru/RuO$_2$hybride bottom electrode is thought to be the available structure for the bottom electrode.

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Electrical Properties of PZT Thin Films Deposited on the Ru/$RuO_2$ Metal/Oxide Hybrid Electrodes (Ru/$RuO_2$ 금속/산화물 이중전극 위에 증착한 PZT 박막의 전기적 특성)

  • Jeong, Kyu-Won;Park, Young;Song, Joon-Tae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.14 no.4
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    • pp.281-288
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    • 2001
  • PZT thin films (3500$\AA$) have been prepard on the Ru/Ru $O_2$ and Ru $O_2$ bottom electrodes with a RF magnetron sputtering system using P $b_{1.05}$(Z $r_{0.52}$, $Ti_{0.48}$) $O_3$ ceramic target. Ru/Ru $O_2$ bottom electrode was fabricated by in-situ processing controlled the $O_2$ partial pressure. The PZT thin films deposited on the Ru/Ru $O_2$ bottom electrode were preferred oriented (101) plane. The PZT thin films deposited on the Ru/Ru $O_2$ bottom electrodes showed better electrical properties than those with Ru $O_2$ bottom electrodes because Ru $O_2$ prevented oxygen vacancies and impurities from existing withing the interface and substrate.e.

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Effect of Electrochemical Reduction of Ruthenium Black Cathode Catalyst on the Performance of Polymer Electrolyte Membrane Fuel Cells (캐소드 루테늄 촉매의 전기화학적 환원 처리가 고분자 전해질 연료전지 성능에 미치는 영향)

  • Choi, Jong-Ho
    • Journal of the Korean Electrochemical Society
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    • v.14 no.2
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    • pp.110-116
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    • 2011
  • Ru black was used for cathode catalyst in polymer electrolyte membrane fuel cell which showed low performance at the initial test. However, it was observed that the performance of Ru black cathode was dramatically enhanced after certain kind of experiment compared with initial one. It might be due to an electrochemical treatment in which a voltage was applied to the Ru cathode for constant period time. When a constant potential of 0.1 V was applied to Ru cathode for 30 min, the fuel cell performance of Ru cathode showed the best results. In order to investigate the effect of electrochemical treatment on the performance enhancement, the characteristics of electrochemically treated Ru black was compared with that of Ru black which was reduced under $H_2$ atmosphere. From XRD results, it was turned out that Ru black was not completely converted to metallic Ru by electrochemical treatment, but it is sufficient to be one of reasons for the performance enhancement. According to the results of CO stripping voltammetry, it was observed that some Ru was removed from Ru electrode by electrochemical treatment which might have a bad effect on the fuel cell performance. The removal of some Ru from as-received Ru black by electrochemical treatment is also another reason for the enhancement of fuel cell performance.

A Study on the Plasma Etching of Ru Electrodes using $O_2/Cl_2$ Helicon Discharges

  • Kim, Hyoun-Woo;Hwang, Woon-Suk
    • Corrosion Science and Technology
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    • v.2 no.4
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    • pp.189-193
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    • 2003
  • The Ru etching using $O_2/C_{12}$ plasmas has been studied by employing the helicon etcher. The changes of Ru etch rate, Ru to $SiO_2$ etch selectivity and Ru electrode etching slope with varied process variables were investigated. The Ru etching slope at the optimized etching condition was measured to be $84^{\circ}$. We reveal that the Ru etching using $O_2/C_{12}$ plasma generates the $RuO_2$ thin film. Possible mechanism of Ru etching is discussed.

Synthesis of Trimetallic (PtRu-Sn/VC, PtRu-Ni/VC) Catalysts by Radiation Induced Reduction for Direct Methanol Fuel Cell (DMFC) (방사선환원법을 이용한 직접메탄올연료전지용(DMFC) 삼성분계촉매(PtRu-Sn/VC, PtRu-Ni/VC)의 합성)

  • Kim, Sang Kyum;Park, Ji Yun;Hwang, Sun Choel;Lee, Do Kyun;Lee, Sang Heon;Rhee, Young Woo;Han, Moon Hee
    • Clean Technology
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    • v.19 no.3
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    • pp.320-326
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    • 2013
  • Nano-sized PtRu-Ni/VC and PtRu-Sn/VC electrocatalysts were synthesized by a one-step radiation-induced reduction (RIR) (30 kGy) process using distilled water as the solvent and Vulcan XC-72 as the supporting material. The obtained electrocatalysts were characterized by transmission electron microscopy (TEM), scanning electron microscope energy dispersive spectroscopic (SEM-EDS), X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS), respectively. The catalytic efficiency of electrocatalysts was examined for oxygen reduction, MeOH oxidation and CO stripping decreased in the following order, Hydrogen stripping : PtRu-Sn/VC > PtRu-Ni/VC > PtRu/VC$^{(R)}$ (E-TEK). MeOH oxidation : PtRu-Sn/VC > PtRu-Ni/VC > PtRu/ VC$^{(R)}$ (E-TEK). Unit cell performance : PtRu-Sn/VC > PtRu-Ni/VC > PtRu/VC$^{(R)}$ (E-TEK) catalysts.

Electrochemical Characteristics on Methanol Oxidation of Pt-Ru/PPy/Nafion Composite Electrode (Pt-Ru/PPy/Nafion 복합체 전극의 메탄을 산화 특성)

  • Cho Seung-Koo;Park Jong-Ho
    • Journal of the Korean Electrochemical Society
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    • v.7 no.4
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    • pp.201-205
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    • 2004
  • The Pt-Ru electrocatalyst was Prepared on Nafion membrane modified with Polypyrrole by chemical reduction of $H_2PtCI_6\;and\;RuCl_3$ solution ai precursor. From the electron dispersive microanalysis spectroscope(EDS), the Pt-Ru catalyst was located on the surface of Ppy/Nafion composite. The electrochemical oxidation of methanol on Pt-Ru catalyst deposited in Polypyrrole-impregnated Nafion was investigated by cyclic voltammetry (CV) and chronoamperometry. The onset potential of methanol oxidation was shifted to negative potential as the $RuCI_3$ concentration in deposition solution. Also, it was known that the Pt-Ru binary catalyst on Nafion could be directly deposited by using Polypyrrole and resulting Pt-Ru/PPy/Nafion was available for methanol oxidation.

The study of the properties of PZT thin films deposited on $Ru/RuO_{2}$ electrode ($Ru/RuO_{2}$ 이중 전극위에 성장한 PZT 박막의 특성에 관한 연구)

  • Choi, Jang-Hyun;Kang, Hyun-Il;Park, Young;Somg, Joon-Tae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • pp.394-397
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    • 2001
  • In this paper, in-situ deposited $Ru/RuO_2$ bottom electrodes have been investigated as new bottom electrodes for PZT thin film capacitor application. As a comparison, structural and electrical properties of PZT thin films on Pt/Ti and $RuO_2$ bottom electrodes are also investigated. The use of $Ru/RuO_2$ hybrid electrodes showed better electrical properties in compression with $RuO_2$ bottom electrode. With increasing Ru electrode thickness, the PZT thin films showed preferred orientation along the (110) direction and and leakage current of PZT thin films were improved. The PZT thin films on Ru (100nm)/$RuO_2$ electrodes exhibited excellent ferroelectric properties such as remant polarization and coercive field of $7.2C/cm^2$ and 46.35 kV/cm, respectively.

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Electrodic properties of PZT thin films growed on Ru/$RuO_2$ bottom eletrode (Ru/$RuO_2$ 하부전극에 성장한 PZT 박막의 전기적 특성 연구)

  • Choi, Jang-Hyun;Kang, Hyun-Il;Kim, Eung-Kwon;Park, Young;Song, Joon-Tae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • pp.58-62
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    • 2002
  • Pb($Zr_{0.52}Ti_{0.48}$)$O_3$ (PZT) thin films deposited on the Pt/Ti and Ru/$RuO_2$ bottom electrode by rf magnetron sputtering methode. Ru/$RuO_2$ bottom electrode deposited on the p-type wafer as Ru thickness by in-situ process. Our results show that all PZT films indicated perovskite polycrystalline structure with perferred orientation (110) and no pyrochlore phase is observed. A well-fabricated $RuO_2$/PZT/Ru(100nm)/$RUO_2$ capacitor showed a leakage current density in the order of $2.13{\times}10^{-7}A/cm^2$ as 100 kV/cm, a remanent polarization of 7.20 ${\mu}C/cm^2$, and a coercive field of 58.37 kV/cm. The results show that the new Ru/$RuO_2$ bottom electrodes are expected to reduce the degradation ferroelectric fatigue and excellent ferroelectric properties.

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The study of the properties of PZT thin films deposited on Ru/RuO$_2$ electrode (Ru/RuO$_2$ 이중 전극위에 성장한 PZT 박막의 특성에 관한 연구)

  • Choi, Jang-Hyun;Kang, Hyun-Il;Park, Young;Song, Joon-Tae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • pp.394-397
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    • 2001
  • In this paper, in-situ deposited Ru/RuO$_2$ bottom electrodes have been investigated as new bottom electrodes for PZT thin film capacitor application. As a comparison, structural and electrical properties of PZT thin films on Pt/Ti and RuO$_2$ bottom electrodes are also investigated. The use of Ru/RuO$_2$ hybrid electrodes showed better electrical properties in compression with RuO$_2$ bottom electrode. With increasing Ru electrode thickness, the PZT thin films showed preferred orientation along the (110) direction and leakage current of PZT thin films were improved. The PZT thin films on Ru (100nm)/RuO$_2$ electrodes exhibited excellent ferroelectric properties such as remant polarization and coercive field of 7.2 C/$\textrm{cm}^2$ and 46.35 kV/cm, respectively.

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