• Title, Summary, Keyword: PL (photoluminescence)

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Comparison of In-situ Er-doped GaN with Er-implanted GaN Using Photoluminescence and Photoluminescence Excitation Spectroscope (In situ Er 도핑된 GaN와 Er이 이온 주입된 GaN의 PL과 PLE 비교에 대한 연구)

  • 김현석;성만영;김상식
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.2
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    • pp.89-96
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    • 2003
  • Photoluminescence (PL) and photoluminescence excitation (PLE) spectroscopy have been performed at 6 K on the 1540 nm $^4$I$\_$(13/2)/\longrightarrow$^4$I$\_$(15/2)/ emission of Er$\^$+3/ in in situ Er-doped GaN The PL and PLE spectra of in situ Er-doped GaN are compared with those of Er-implanted GaN in this study. The lineshapes of the broad PLE absorption bands and the broad PL bands in the spectra of the in situ Er-doped GaN are similar to those in Er-doped glass rather than in the Er-implanted GaN. The PL spectra of this in situ Er-doped GaN are independent of excitation wavelength and their features are significantly different from the site-selective PL spectra of the Er-implanted GaN. These PL and PLE studies reveal that a single type of Er$\^$3+/ sites is present in the in situ Er-doped GaN and these Er sites are different from those observed in the Er-implanted GaN. In addition, the comparison of the PL single strength illustrates that the excitation of Er$\^$3+/ sites through the energy absorption of defects in Er-implanted GaN.

Photoluminescence from silicon nanocrystals in silicon ion implanted SiO2 layers (실리콘 이온주입 SiO2층의 나노결정으로 부터의 광루미네센스)

  • Kim, Kwang-Hee;Oh, Hang-Seok;Jang, Tae-Su;Kwon, Young-Kyu;Lee, Yong-Hyun
    • Journal of Sensor Science and Technology
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    • v.11 no.3
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    • pp.183-190
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    • 2002
  • Photoluminescence(PL) properties of $Si^+$-implanted $SiO_2$ film, which was thermally grown on c-Si substrate, is reported. We have compared room temperature photoluminescence (PL) spectra of the samples which was made in several kinds of implantation, subsequent annealing and $SiO_2$ film thickness. XRD data was correlated with the PL spectra. Silicon nanocrystals in $SiO_2$ film is considered as the origin of the photoluminescence. PL spectra was investigated after wet etching of the $SiO_2$ film by using BOE (Buffered Oxide Etchant) at every one minute. PL peak wavelength was varied as the etching is proceeded. These results indicate that the quantity and the distribution of dominant size of Si nanocrystals in $SiO_2$ film seem to have a direct effect on PL spectrum.

Photoluminescence and Photoluminescence Excitation from Porous Silicon Carbide

  • Lee, Gi Hwan;Ying Lei Du;Lee, Tae Ho
    • Bulletin of the Korean Chemical Society
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    • v.21 no.8
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    • pp.769-773
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    • 2000
  • The dependence of photoluminescence (PL) and photoluminescence itation (PLE) on preparation condi-tions and the aging of porous silicon carbide (PSC) have been investigatted. The fiber size of the material pre-pared under dark-current mode, labele d DCM, was larger than that of the photoassisted (PA)process.The intensity of the PL spectrum for the PA condition was higher than that of the DCM condition. The PA condition giving small fiber size exhibited amore prominent high-energy component but the emission bands of both con-ditionsobserved were rather similar. The origin of the PL may have played an importantrole in the surface defect center introduced by the reaction conditions ofHFatthe surface of the silicon carbide. Selective excita-tion of the PL bandsusingdifferent excitation wavelengths has been used to identify distinct componentswith-in the PL bandwidth. Two main PL bands with peak wavelength of494 and534 nm were clearly resolved. On the other hand, selectivc emission of the PLEbands using different emission wavelengths has been used to identify distinct components within the PLE bandwidth. The higher energy band with peak wavelength of 338 nm and the lower energy bands involving 390,451 and 500 nm were clearly resolved. According to the pro-ionged aging in air, PL spectra appearedasone band, This emission probably originated from states localized to the band-to-band recombination due to the oxidation on the crystallite surface.

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Photoluminescence Studies of InP/InGaP Quantum Structures Grown by a Migration Enhanced Molecular Beam Epitaxy

  • Cho, Il-Wook;Ryu, Mee-Yi;Song, Jin Dong
    • Applied Science and Convergence Technology
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    • v.25 no.4
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    • pp.81-84
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    • 2016
  • InP/InGaP quantum structures (QSs) grown on GaAs substrates by a migration-enhanced molecular beam epitaxy method were studied as a function of growth temperature (T) using photoluminescence (PL) and emission-wavelength-dependent time-resolved PL (TRPL). The growth T were varied from $440^{\circ}C$ to $520^{\circ}C$ for the formation of InP/InGaP QSs. As growth T increases from $440^{\circ}C$ to $520^{\circ}C$, the PL peak position is blue-shifted, the PL intensity increases except for the sample grown at $520^{\circ}C$, and the PL decay becomes fast at 10 K. Emission-wavelength-dependent TRPL results of all QS samples show that the decay times at 10 K are slightly changed, exhibiting the longest time around at the PL peak, while at high T, the decay times increase rapidly with increasing wavelength, indicating carrier relaxation from smaller QSs to larger QSs via wetting layer/barrier. InP/InGaP QS sample grown at $460^{\circ}C$ shows the strongest PL intensity at 300 K and the longest decay time at 10 K, signifying the optimum growth T of $460^{\circ}C$.

Effects of Lattice Mismatch on Photoluminescence Efficiency of InGaAsP/InP Heterostructures (InGaAsP/InP이종접합구조의 격자부정합이 Photoluinescence효율에 미치는 영향)

  • Lee, Jong-Won
    • Korean Journal of Materials Research
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    • v.4 no.5
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    • pp.516-523
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    • 1994
  • The interfacial coherency of metal organic chemical vapor deposition grown InGaAsP/InP heterostructure wafers was examined and their influences on the optoelectronic properties were investigated in this study. (400) symmetric and (511) asymmetric reflections were employed to measure the lattice coherency. Existence of misfit dislocations was examined by x-ray topography and reverified by photoluminescence (PL) imaging. PI, measurements were performed, and higher PL intensity was obtained for elastically strained samples and lower intensity for plastically deformed samples. The highest PL intensity was obtained for the sample lattice matched at the growth temperature. PL full-width at half maximum (FWHM) was found to depend on the degree of lattice mismatch. A correlatior between x-ray FWHM and PL intensity was empirically established. The results presented demonstrate that the interfacial coherency is of primary significance in affecting the optoelectronic properties through elastic strain and plastic deformation.

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Time-resolved Photoluminescence Study of Seven-stacked InAs/InAlGaAs Quantum Dots

  • O, Jae-Won;Gwon, Se-Ra;Ryu, Mi-Lee;Jo, Byeong-Gu;Kim, Jin-Su
    • Proceedings of the Korean Vacuum Society Conference
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    • pp.265-265
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    • 2011
  • 자발형성법으로 InP (001) 기판에 성장한 InAs/InAlGaAs 양자점(QDs: quantum dots)의 광학적 특성을 PL (photoluminescence)와 TRPL (time-resolved PL)을 이용하여 분석하였다. InAs QDs 시료는 single layer InAs QDs (QD1)과 7-stacked InAs QDs (QD2)를 사용하였다. 두 시료 모두 저온 (10 K)에서 1,320 nm에서 PL 피크가 나타나고, 온도가 증가함에 따라 PL 피크는 적색편이 (red-shift)를 보였다. 양자점의 온도를 10 K에서 300 K까지 증가하였을 때 QD1은 178 nm 적색편이 하였으며, PL 스펙트럼 폭은 온도가 증가함에 따라 증가하였다. 그러나 QD2는 264 nm 적색편이를 보였으며 PL 스펙트럼의 폭은 QD1 시료와 반대로 온도가 증가함에 따라 감소하였다. QD2의 아주 넓은 PL 스펙트럼 폭과 매우 큰 적색편이는 InAs 양자점 크기의 변화가 QD1에 비해 훨씬 크기 때문이다. QD2의 경우 InAs 층수(layer number)가 증가함에 따라 InAs QD의 크기가 점차 증가하므로 QD 크기의 변화가 single layer인 QD1 시료보다 훨씬 크다. QD1의 PL 소멸은 파장이 증가함에 따라 점차 느려지다가 PL 피크 근처에서 가장 느린 소멸 곡선을 보이고, 파장이 더 증가하였을 때 PL 소멸은 점차 빠르게 소멸하였다. 그러나 QD2의 PL 소멸곡선은 파장이 증가함에 따라 점차 빠르게 소멸하였다. 이것은 QD2는 양자점 크기의 변화가 매우 크기 때문에 (lateral size=18~29 nm, height=2.8~5.9 nm) 방출파장이 증가함에 따라 양자점 사이의 파동함수의 겹침이 증가하여 캐리어의 이완이 증가하기 때문으로 설명된다. 온도에 따른 TRPL 결과는 두 시료 모두 10 K에서 150 K 까지는 소멸시간이 증가하였고, 150 K 이후부터는 소멸시간이 감소하였다. 온도가 증가함에 따라 소멸시간이 증가하는 것은 양자점에서 장벽과 WL (wetting layer)로 운반자(carrier)의 이동, 양자점들 사이에 열에 의해 유도된 운반자의 재분배 등으로 인한 발광 재결합으로 설명할 수 있다. 150 K 이상에서 소멸시간이 감소하는 것은 열적효과에 의한 비발광 재결합 과정에 의한 운반자의 소멸이 증가하기 때문이다. 온도에 따른 TRPL 결과는 두 시료 모두 150 K까지는 발광재결합이 우세하고, 150 K 이상에서 비발광재겹합이 우세하게 나타났다.

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Visible Photoluminescence from Hydrogenated Amorphous Silicon Substrates by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition (ECR-PECVD로 증착한 a-Si : H/Si으로 부터의 가시 PHotoluminescence)

  • Shim, Cheon-Man;Jung, Dong-Geun;Lee, Ju-Hyeon
    • Korean Journal of Materials Research
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    • v.8 no.4
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    • pp.359-361
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    • 1998
  • Visible photoluminescence(PU was observed from hydrogenated amorphous silicon deposited on silicon(a-Si : H/Si) using electron cyclotron resonance plasma enhanced chemical vapor deposition (ECR- PECVD) with silane ($SiH_{4}$) gas as the reactant source. The PL spectra from a-Si : H/Si were very similar to those from porous silicon. Hydrogen contents of samples annealed under oxygen atmosphere for 2minutes at $500^{\circ}C$ by rapid thermal annealing were reduced to 1~2%, and the samples did not show visible PL, indicating that hydrogen has a very important role in the PL process of a- Si : H/Si. As the thickness of deposited a-Si : H film increased, PL intensity decreased. The visi¬ble PL from a-Si: H deposited on Si by ECR-PECVD with $SiH_{4}$ . is suggested to be from silicon hydrides formed at the interface between the Si substrate and the deposited a-Si : H film during the deposition.

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Effect of thiophenol-based ligands on photoluminescence of quantum dot nanocrystals

  • Moon, Hyungseok;Jin, Hoseok;Kim, Bokyoung;Kang, Hyunjin;Kim, Daekyoung;Chae, Heeyeop
    • Proceedings of the Korean Vacuum Society Conference
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    • pp.197-197
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    • 2016
  • Quantum dot nanocrystals(QDs) have been emerged as next generation materials in the field of energy harvesting, sensor, and light emitting because of their compatibility with solution process and controllable energy band gap. Especially, characteristics of color tuning and color purity make it possible for QDs to be used photoluminescence materials. Photoluminescence devices with QDs have been researched for a long time. Photoluminescence quantum yield(PL QY) is important factor that defines the performance of Photoluminescence devices. One of the ways to achieve better PL QY is ligand modification. If ligands are changed to proper electron donating group, electrons can be confined in the core which results in enhancement of PL QY. Because of the reason, short ligands are preferred for enhancing PL QY. Thiophenol-based ligands are shorter than typical alkyl chain ligands. In this study, the effect of thiophenol-based ligands with different functional groups are investigated. Four different types of thiophenol-based organic materials are used as organic capping ligand. QDs with bare thiophenol and fluorothiophenol show better quantum yield compared to oleic acid.

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Properties of Silicon for Photoluminescence

  • Baek, Dohyun
    • Applied Science and Convergence Technology
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    • v.23 no.3
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    • pp.113-127
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    • 2014
  • For more than five decades, silicon has dominated the semiconductor industry that supports memory devices, ICs, photovoltaic devices, etc. Photoluminescence (PL) is an attractive silicon characterization technique because it is contactless and provides information on bulk impurities, defects, surface states, optical properties, and doping concentration. It can provide high resolution spectra, generally with the sample at low temperature and room-temperature spectra. The photoluminescence properties of silicon at low temperature are reviewed and discussed in this study. In this paper, silicon bulk PL spectra are shown in multiple peak positions at low temperature. They correspond with various impurities such as In, Al, and Be, phonon interactions, for example, acoustical phonons and optical phonons, different exciton binding energies for boron and phosphorus, dislocation related PL emission peak lines, and oxygen related thermal donor PL emissions.

Effects of Carrier Leakage on Photoluminescence Properties of GaN-based Light-emitting Diodes at Room Temperature

  • Kim, Jongseok;Kim, Seungtaek;Kim, HyungTae;Choi, Won-Jin;Jung, Hyundon
    • Current Optics and Photonics
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    • v.3 no.2
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    • pp.164-171
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    • 2019
  • Photoluminescence (PL) properties of GaN-based light-emitting diodes (LEDs) were analyzed to study the effects of carrier leakage on the luminescence properties at room temperature. The electrical leakage and PL properties were compared for LEDs showing leakages at forward bias and an LED with an intentional leakage path formed by connecting a parallel resistance of various values. The leakages at the forward bias, which could be observed from the current-voltage characteristics, resulted in an increase in the excitation laser power density for the maximum PL efficiency (ratio of PL intensity to excitation power) as well as a reduction in the PL intensity. The effect of carrier leakages on PL properties was similar to the change in PL properties owing to a reduction of the photovoltage by a reverse current since the direction of the carrier movement under photoexcitation is identical to that of the reverse current. Valid relations between PL properties and electrical properties were observed as the PL properties deteriorated with an increase in the carrier leakage. The results imply that the PL properties of LED chips can be an indicator of the electrical properties of LEDs.