• Title, Summary, Keyword: Imprinting

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Study on the Formation of Residual Layer Thickness by Changing Magnitude and Period of UV Imprinting Pressure (UV임프린트 공정에서 임프린팅 가압력 및 가압시간에 따른 레진 잔막 두께형성에 대한 실험연구)

  • Shin, Dong-Hyuk;Jang, Si-Youl
    • Tribology and Lubricants
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    • v.26 no.5
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    • pp.297-302
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    • 2010
  • This study is focused on the resin layer formation of UV imprinting process by changing imprinting pressure and period. The mold shape is made for the process of window open over the pattern transfer area and the imprinting period is assigned as the time just before the UV light curing. The residual layer is measured by changing the imprinting period and pressure magnitude, and the measured data of residual layer provides useful information for the design of the process conditions of imprinting processes.

Replication of Hybrid Micropatterns Using Selective Ultrasonic Imprinting (선택적 초음파 임프린팅을 사용한 복합 미세패턴의 복제기술)

  • Lee, Hyun Joong;Jung, Woosin;Park, Keun
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.39 no.1
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    • pp.71-77
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    • 2015
  • Ultrasonic imprinting is a micropattern replication technology for a thermoplastic polymer surface that uses ultrasonic vibration energy; it has the advantages of a short cycle time and low energy consumption. Recently, ultrasonic imprinting has been further developed to extend its functionality: (i) selective ultrasonic imprinting using mask films and (ii) repetitive ultrasonic imprinting for composite pattern development. In this study, selective ultrasonic imprinting was combined with repetitive imprinting in order to replicate versatile micropatterns. For this purpose, a repetitive imprinting technology was further extended to utilize mask films, which enabled versatile micropatterns to be replicated using a single mold with micro-prism patterns. The replicated hybrid micropatterns were optically evaluated through laser light images, which showed that versatile optical diffusion characteristics can be obtained from the hybrid micropatterns.

Vibration Analysis of a Nano Imprinting Stage Using CAE (CAE를 이용한 나노 임프린팅 스테이지의 진동 해석)

  • Lee, Kang-Wook;Lee, Jae-Woo;Lee, Sung-Hoon;Lim, Si-Hhyung;Jung, Jae-Il;Yim, Hong-Jae
    • Proceedings of the Korean Society for Noise and Vibration Engineering Conference
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    • pp.579-584
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    • 2008
  • A nano-imprinting stage has been widely used in various fields of nanotechnology. In this study, an analysis method of a nano-imprinting stage machine using FEM and flexible multi-body vibration has been presented. The simulation using CAE for the imprinting machine is to analyze vibration characteristics of 3-axis nano-imprinting stage and 4-axis nano-imprinting stage. Structural components such as the upper plate have been modeled with finite elements to analyze flexibility effects during the precision stage motion. In this paper flexible multi-body dynamic simulation is executed to support robust design of the precision stage mechanism.

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Development of Continuous UV Nano Imprinting Process Using Pattern Roll Stamper (패턴 롤 스템퍼를 이용한 연속 UV 나노 임프린팅 공정기술 개발)

  • Cha, J.;Ahn, S.;Han, J.;Bae, H.;Myoung, B.;Kang, S.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • pp.105-108
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    • 2006
  • It has been issued to fabricate nano-scale patterns with large-scale in the field of digital display. Also, large-scale fabrication technology of nano pattern is very important not only for the field of digital display but also for the most of applications of the nano-scale patterns in the view of the productivity. Among the fabrication technologies, UV nano imprinting process is suitable for replicating polymeric nano-scale patterns. However, in case of conventional UV nano imprinting process using flat mold, it is not easy to replicate large areal nano patterns. Because there are several problems such as releasing, uniformity of the replica, mold fabrication and so on. In this study, to overcome the limitation of the conventional UV nano imprinting process, we proposed a continuous UV nano imprinting process using a pattern roll stamper. A pattern roll stamper that has nano-scale patterns was fabricated by attaching thin metal stamper to a roll base. A continuous UV nano imprinting system was designed and constructed. As practical examples of the process, various nano patterns with pattern size of 500, 150 and 50nm were fabricated. Finally, geometrical properties of imprinted nano patterns were measured and analyzed.

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Molecular Dynamics Study on the Effect of Process Parameters on Nanoimprint Lithography Process (공정인자들이 나노임프린트 리소그래피 공정에 미치는 영향에 대한 분자동역학 연구)

  • Kang, Ji-Hoon;Kim, Kwang-Seop;Kim, Kyung-Woong
    • Tribology and Lubricants
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    • v.22 no.5
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    • pp.243-251
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    • 2006
  • Molecular dynamics simulations of nanoimprint lithography NIL) are performed in order to investigate effects of process parameters, such as stamp shape, imprinting temperature and adhesive energy, on nanoimprint lithography process and pattern transfer. The simulation model consists of an amorphous $SiO_{2}$ stamp with line pattern, an amorphous poly-(methylmethacrylate) (PMMA) film and an Si substrate under periodic boundary condition in horizontal direction to represent a real NIL process imprinting long line patterns. The pattern transfer behavior and its related phenomena are investigated by analyzing polymer deformation characteristics, stress distribution and imprinting force. In addition, their dependency on the process parameters are also discussed by varying stamp pattern shapes, adhesive energy between stamp and polymer film, and imprinting temperature. Simulation results indicate that triangular pattern has advantages of low imprinting force, small elastic recovery after separation, and low pattern failure. Adhesive energy between surface is found to be critical to successful pattern transfer without pattern failure. Finally, high imprinting temperature above glass transition temperature reduces the imprinting force.

Dynamic Analysis of a Nano Imprinting Stage Using CAE (CAE를 이용한 나노 임프린트 스테이지의 동적 거동해석)

  • Lee, Kang-Wook;Lee, Min-Gyu;Lee, Jae-Woo;Lim, Si-Hyung;Shin, Dong-Hoon;Jang, Si-Youl;Jeong, Jae-Il;Yim, Hong-Jae
    • Transactions of the Korean Society of Machine Tool Engineers
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    • v.16 no.5
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    • pp.211-217
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    • 2007
  • A nano-imprinting stage has been widely used in various fields of nanotechnology. In this study, an analysis method of a nano-imprinting stage machine using FEM and flexible multi-body kinematics and dynamics has been presented. We have developed a virtual imprinting machine to evaluate the prototype design in the early design stage. The simulation using CAE for the imprinting machine is not only to analyze static and dynamic characteristics of the machine but also to determine design parameters of the components for the imprinting machine, such as dimensions and specifications of actuators and sensors. Structural components as the upper plate, the rotator, the shaft and the translator have been modeled with finite elements to analyze flexibility effects during the precision stage motion. In this paper flexible multi-body dynamic simulation is executed to support robust design of the precision stage mechanism. In addition, we made the 4-axis stage model to compare the dynamic behavior with that of 3-axis stage model.

Design and fabrication of wafer scale microlens array for image sensor using UV-imprinting (UV 임프린팅을 이용한 이미지 센서용 웨이퍼 스케일 마이크로렌즈 어레이 설계 및 제작)

  • Kim, Ho-Kwan;Kim, Seok-Min;Lim, Ji-Seok;Kang, Shin-Ill
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • pp.100-103
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    • 2007
  • A microlens array has been required to improve light conversion efficiency in image sensors. A microlens array can be usually fabricated by photoresist reflow, hot-embossing, micro injection molding, and UV-imprinting. Among these processes, a UV-imprinting, which is operated at room temperature with relatively low applied pressure, can be a desirable process to integrate microlens array on image sensors, because this process provides the components with low thermal expansion, enhanced stability, and low birefringence, furthermore, it is more suitable for mass production of high quality microlens array. In this study, to analyze the optical properties of the wafer scale microlens array integrated image sensor, another wafer scale simulated image sensor chip array was designed and fabricated. An aspherical square microlens was designed and integrated on a simulated image sensor chip array using a UV-imprinting process. Finally, the optical performances were measured and analyzed.

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State of the art and technological trend for the nano-imprinting lithography equipment (나노 임프린팅 리소그래피 장비의 기술개발 동향)

  • 이재종;최기봉;정광조
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • pp.196-198
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    • 2003
  • Classical lithography in semiconductor employs stepper technologies. Limits of this technology are clearly seen at structures below 100nm. Nano-imprinting lithography is a new method for generating patterns in submicron range at reasonable cost. In order to manufacture nano-imprinting lithography(NIL) equipment, several NIL manufacturers have been developing key technologies for realization of nano-imprinting process, recently. In this paper, we've been describe state-of-the-art and technology trends for nano-imprinting lithography equipments.

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Nano-mold fabrication for imprinting lithography (나도 Imprinting 을 위한 몰드 제작에 관한 연구)

  • Lee, Jin-Hyung;Lim, Hyun-Uoo;Kim, Tae-Gon;Lee, Seung-Seoup;Park, Jin-Goo;Lee, Eun-Kyu;Kim, Yang-Sun;Han, Chang-Su
    • Proceedings of the KSME Conference
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    • pp.1073-1077
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    • 2003
  • This study aims to investigate the fabrication process of nano silicon mold using electron beam lithography (EBL) to generate the nanometer level patterns by nano-imprinting technology. the nano-patterned mold including 100mm pattern size has been fabricated by EBL with different doses ranged from 22 to 38 ${\mu}C/cm^2$ on silicon using the conventional polymethylmetharcylate(PMMA) resist. The silicon mold is fabricated with various patterns such as circles, rectangles, crosses, oblique lines and mixed forms, The effect of dosage on pattern density in EBL is discussed based on SEM (Scannning Electron Microscopy) analysis of fabricated molds. The mold surface is modified by hydrophobic fluorocarbon (FC) thin films to avoid the stiction during nano-imprinting process.

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A Study on the Liquid Crystal Orientation Characteristics of the Inorganic NiOx Film with Aligned Nanopattern Using Imprinting Process (무기막 NiOx의 정렬 패턴 전사를 이용한 액정의 배향 특성 연구)

  • Oh, Byeong-Yun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.32 no.5
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    • pp.357-360
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    • 2019
  • We demonstrate an alignment technology using an imprinting process on an inorganic NiOx film. The aligned nanopattern was fabricated on a silicon wafer by laser interference lithography. The aligned nano pattern was then imprinted onto the sol-gel driven NiOx film using an imprinting process at an annealing temperature of $150^{\circ}C$. After the imprinting process, parallel grooves had been formed on the NiOx film. Atomic force microscopy and water contact angle measurements were performed to confirm the parallel groove on the NiOx film. The grooves caused liquid crystal alignment through geometric restriction, similar to grooves formed by the rubbing process on polyimide. The liquid crystal cell exhibited a pretilt angle of $0.2^{\circ}$, which demonstrated homogeneous alignment.