• Title, Summary, Keyword: Electron Beam

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Design for High Voltage Generator of Electron Beam Manufacturing System (전자빔 가공기를 위한 고전압 발생 장치 설계)

  • 임선종;강재훈;이찬홍
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • pp.564-567
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    • 2004
  • In the manufacture of integrated circuits, photolithography is the lowest yield step in present production lines. Electron beams form a powerful set of tools with which to attack this problem. Electron beams can be used to make patterns that are smaller than can a photolithography. We design a high voltage generator of electron beam manufacturing system. For this purpose, first, the configuration of electron beam manufacturing system was analyzed. Second, the basic configuration of a high voltage generator and test results were presented.

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A Study on the Electron Beam Distribution based on Age-diffusion Model (Age diffusion model을 이용한 전자선량 분포에 대한 연구)

  • Kim, S.H.;Suh, T.S.;Na, Y.J.
    • Proceedings of the KOSOMBE Conference
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    • v.1997 no.11
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    • pp.161-163
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    • 1997
  • In this paper, a two-dimensional electron beam dose calculational algorithm implented for use in a two-dimensional radiation therapy planning system is described. The 2-D electron beam calculations have been in use clinically for a few decades. Our algorithm uses Age-diffusion model based int the Boltzman Transport Equation. Our implementation provides convenient user interface associated with electron beam therapy planning and displays radiation dose distribution according to different electron energy on patient images.

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Measurements of Developed Patterns by Direct writing of Electron Beam on Different Materials underneath PMMA

  • June, Won-Chae
    • Transactions on Electrical and Electronic Materials
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    • v.3 no.3
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    • pp.1-7
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    • 2002
  • The developed patterns by direct writing of electron beam are measured by AFM, FESEM and optical profiler of WYKO NT3300. From different measurement methods, the measured linewidths of the patterns are shown a little bit wider than designed pattern size due to electrons scattering effect during direct writing of electron beam. The optimized conditions of these experiments are suggested and explained for the forming of structures below 0.1 ㎛ dimension size. Because of electron scattering effects from the different under layers such as Si, Si$_3$N$_4$ and aluminum, the developed pattern size is also influenced by the accelerated energy of electrons, dose, resist and soft and hard bake conditions in PMMA. The distributions of electron beam and calculations of backscattering coefficient are demonstrated by Monte Carlo simulation. From the measured results, the developed linewidth of PMMA/Al /silicon is shown a little bit wider than that of PMMA/Si$_3$N$_4$/silicon structure due to the backscattering effects.

Design and Analysis of Magnetic Field Control in Electron Lenses for a E-Beam Writer (전자빔 가공기용 자기 렌즈의 자기장 제어구조 설계)

  • 노승국;이찬홍;백영종
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • pp.401-404
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    • 2004
  • The electron beam machining provides very high resolution up to nanometer scale, hence the E-beam writing technology is rapidly growing in MEMS and nano-engineering areas. In the optical column of the e-beam writer, there are several lenses condensing and focusing electron beams from electron gun with fringing magnetic fields. To achieve small spot size as 1-2 nm for higher power of electron beam, magnetic lenses should be designed considering their magnetic field distribution. In this paper, the magnetic field at two condenser lenses and object lens are calculated with finite element method and discussed its performances.

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Electron Beam Behaviors by the Electrostatic Lens in Triode Field Emission Gun (3극 전계방출 전자총의 정전기 렌즈에 의한 전자빔 거동)

  • Kim, Chung-Soo;Kim, Dong-Hwan;Park, Man-Jin;Jang, Dong-Young;Han, Dong-Chul
    • Transactions of the Korean Society of Machine Tool Engineers
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    • v.16 no.6
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    • pp.163-167
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    • 2007
  • A field emission electron gun including 3 electrodes including one cathode and two anodes is very important for high resolution electron microscope. To have functions to control the initially-emitted electron beam, two anodes act as an electrostatic lens according to equipotential lines by adjusting the spot size, intensity, and working distance. To verify the action of the electron beam by the electrostatic lens by changing several parameters such as electrode shape, displacement and applied voltage to the electrodes, the two lenses were design and simulated and then their performances were analyzed with angular beam intensity(distribution), electrical optic axis variation and their stability.

Effect of Electron Beam Irradiation on the Properties of Softwood Unbleached Kraft Pulp (전자선 전처리에 따른 침엽수 미표백 크라프트 펄프의 특성평가)

  • Kim, Eun Hea;Lee, Ji Young;Jeun, Joon Pyo;Kim, Sun Young;Kim, Chul Hwan;Park, Jong Hye
    • Journal of Korea Technical Association of The Pulp and Paper Industry
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    • v.47 no.5
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    • pp.68-73
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    • 2015
  • Electron beam irradiation is also an eco-friendly treatment compared to other physical and chemical treatments. In this study, we attempted to evaluate the possibilities of energy savings by applying electron beam irradiation to the refining process. After softwood unbleached kraft pulp (UKP) was irradiated with electron beams at 50 and 100 kGy, it was beaten in a laboratory beater, and then its freeness and fiber properties were analyzed. The physical properties of their fiber handsheet were also and measured. As the irradiation dose of the electron beam and the beating time increased, lower freeness and fiber lengths of the UKP were observed. Handsheets made from UKP that was irradiated by electron beam and beaten showed a reciprocal relationship with the irradiation dose of the electron beam, in particular, the strength of the handsheets decreased dramatically at 100 kGy of irradiation. Therefore, it was confirmed that electron beam irradiation is effective in reducing the beating time or beating energy. But the irradiation dose must be controlled under 50 kGy to minimize the loss of paper strength.

Influence of ITO-Electrode Deposition Method on the Electro-optical Characteristics of Blue LEDs (ITO 전극 형성 방법이 청색 발광 다이오드의 전기 광학적 특성에 미치는 영향)

  • Han, Jae-Ho;Kim, Sang-Bae;Jeon, Dong-Min
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.44 no.11
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    • pp.43-50
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    • 2007
  • We have investigated the electro-optical characteristics and reliability of LEDs with the Indium-Tin-Oxide (ITO) electrodes formed by different deposition methods: electron beam evaporation, sputtering, and hybrid method of electron beam evaporation and subsequent sputtering. The deposition method of the ITO electrode has significant influence on the electro-optical characteristics and reliability of LEDs. The LEDs with the ITO electrodes formed by sputtering and electron beam evaporation have problems caused by sputtering damage and increased electrical resistance, respectively, and the problems have been solved by the hybrid method.

Study on the Characteristics of Electron Beam Dependent with the Structure of Wiggler in the Miniaturized Free Electron Laser Module (초소형 자유전자레이저 모듈에 있어서 위글러 구조에 따른 전자빔 특성 연구)

  • Kim, Young-Chul;Ahn, Seong-Joon;Kim, Dae-Wook;Kim, Ho-Seob;Ahn, Seung-Joon
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.12 no.3
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    • pp.1319-1326
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    • 2011
  • We have investigated the characteristics of the electron beam (e-beam) in the miniaturized free electron laser module by using the commercial 3D simulation tool OPERA. The e-beam was made parallel before entering the slit-type wiggler by the negative bias applied to the central electrode of the electron lens. With respect to the different structures of the wiggler, we obtained the inner distributions of the electrical potential and the electric field, which was, in turn, used to calculate the trajectory of the e-beam in the wiggler.

A Study on the Low-energy Large-aperture Electron Beam Generator (저에너지 대면적 전자빔 발생장치 개발에 관한 연구)

  • Jo, Ju-Hyeon;Choe, Yeong-Uk;Lee, Hong-Sik;Im, Geun-Hui;U, Seong-Hun;Lee, Gwang-Sik
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.48 no.12
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    • pp.785-790
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    • 1999
  • This research has been carried out to develop a low-energy large-aperture pulsed electron beam generator (LELA), 200keV 1A, for industrial applications. One of the most important feature of this electron beam generator is large electron beam cross section of $190cm^2$. Low energy electron beam generators have been used for water cleaning, flue gas cleaning, and pasteurization, etc. In these applications the cross sectionof the e-beam is related to reaction efficiency. Another important feature of this LELA EB generator is easy maintenance because of its simple structure and relatively low vacuum operation compared to the conventional EB generators. The conventional EB generators need to be scanned because the small cross section thermal electron emitters are used in the conventional EB generators which have small EB cross section. In this research, we use the secondary electrons generated by ion bombardment on the HV cathode surface as a electron source. Therefore we can make any shape of EB cross section without scanning.

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Effects of Electron-Beam Irradiation on Color and Organoleptic Qualities of Ginseng Powders (Electron Beam 조사가 인삼분말의 색도 및 관능적 품질에 미치는 영향)

  • Lee, Mi-Gyeong;Gwon, Jung-Ho;Do, Jae-Ho
    • Journal of Ginseng Research
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    • v.22 no.4
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    • pp.252-259
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    • 1998
  • Electron beam, electrically produced from an electron accelerator, was compared with gamma energy in terms of its influence on color and organoleptic qualities of ginseng powders when exposed to the energy used for their microbial decontamination. Hunter color L and b values were suitable for measuring color characteristics of ginseng powders, which were not significantly changed by the exposure to 5 to 7.5 kGy electron beam and gamma energy. Fifty percent ethanol extracts of irradiated ginseng powders at 10 key showed negligible differences from the non-irradiated control in the pattern of absorption spectra at 280∼800 am, but showed increased values in overall color difference (AE) as compared with powdered samples. Irradiation more than 10 kGy and storage at ambient temperature for 4 months caused browning of powdered samples. Irradiation at more than 10 kGy of electron beam was found a critical level to bring about appreciable changes (p<0.05) in or-ganoleptic qualities such as color and odor of sterilized samples, and red ginseng powder was more susceptible than white one to organoleptic changes by irradiation.

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