• Title, Summary, Keyword: Electron Beam

Search Result 2,129, Processing Time 0.043 seconds

Modeling and Simulation of Electron-beam Lithography Process for Nano-pattern Designs using ZEP520 Photoresist (ZEP520 포토리지스트를 이용한 나노 패턴 형성을 위한 전자빔 리소그래피 공정 모델링 및 시뮬레이션)

  • Son, Myung-Sik
    • Journal of the Semiconductor & Display Technology
    • /
    • v.6 no.3
    • /
    • pp.25-33
    • /
    • 2007
  • A computationally efficient and accurate Monte Carlo (MC) simulator of electron beam lithography process, which is named SCNU-EBL, has been developed for semiconductor nanometer pattern design and fabrication. The simulator is composed of a MC simulation model of electron trajectory into solid targets, an Gaussian-beam exposure simulation model, and a development simulation model of photoresist using a string model. Especially for the trajectories of incident electrons into the solid targets, the inner-shell electron scattering of an target atom and its discrete energy loss with an incident electron is efficiently modeled for multi-layer resists and heterogeneous multi-layer targets. The simulator was newly applied to the development profile simulation of ZEP520 positive photoresist for NGL(Next-Generation Lithography). The simulation of ZEP520 for electron-beam nanolithography gave a reasonable agreement with the SEM experiments of ZEP520 photoresist.

  • PDF

LC Aligning Properties for Homeotropic Alignment of NLC on the SiOx Thin Film as Incident Angle of Electron Beam Evaporation Angle

  • Kim, Jong-Hwan;Kang, Hyung-Ku;Han, Jin-Woo;Kang, Soo-Hee;Kim, Young-Hwan;Hwang, Jeoung-Yeon;Seo, Dae-Shik
    • Transactions on Electrical and Electronic Materials
    • /
    • v.7 no.1
    • /
    • pp.21-25
    • /
    • 2006
  • In this study, liquid crystal (LC) aligning properties for homeotropic alignment on the $SiO_x$ thin film by electron beam evaporation method with electron beam system in accordance with the evaporation angles were investigated. Also, the control of pretilt angles homeotropic aligned LC on $SiO_x$ thin film as the function of the evaporation angles were studied. The uniform vertical LC alignment on the $SiO_x$ thin film surfaces with electron beam evaporation was achieved with all of the thin film angle conditions. It is considerated that the LC alignment on the $SiO_x$ thin film by electron beam evaporation is attributed to elastic interaction between LC molecules and micro-grooves at the $SiO_x$ thin film surface created by evaporation. The values of the pretilt angles according to the evaporation angle were from about $0.7^{\circ}$ to about $3.4^{\circ}$. The highest pretilt angles of about $3.4^{\circ}$ in aligned NLC on the $SiO_x$ thin film surfaces by electron beam evaporation were measured under the condition of $45^{\circ}$. Also, good LC alignment states on the treated $SiO_x$ thin film layer by electron beam evaporation were observed at annealing temperature of $250^{\circ}C$. Consequently, the high pretilt angle and the good thermal stability of LC alignment on the $SiO_x$ thin film by electron beam evaporation can be achieved.

Electron Beam Coherency Determined from Interferograms of Carbon Nanotubes

  • Cho, B.;Oshima, C.
    • Bulletin of the Korean Chemical Society
    • /
    • v.34 no.3
    • /
    • pp.892-898
    • /
    • 2013
  • A field emission projection microscope was constructed to investigate the atomic and chemical-bonding structure of molecules using electron in-line holography. Fringes of carbon nanotube images were found to be interferograms equivalent to those created by the electron biprism in conventional electron microscopy. By exploiting carbon nanotubes as the filament of the electron biprism, we measured the transverse coherence length of the electron beam from tungsten field emitters. The measurements revealed that a partially coherent electron-beam was emitted from a finite area.

A Control of Pretilt Angles for Homeotropic Aligned NLC on the SiOx Thin Film Surface by Electron Beam Evaporation

  • Kang, Hyung-Ku;Han, Jin-Woo;Kang, Soo-Hee;Kim, Jong-Hwan;Kim, Oung-Hwan;Hwang, Jeoung-Yeon;Seo, Dae-Shik
    • Transactions on Electrical and Electronic Materials
    • /
    • v.6 no.6
    • /
    • pp.272-275
    • /
    • 2005
  • We studied the control of pretilt angles for homeotropic aligned nematic liquid crystal (NLC) on SiOx thin film surface by $45^{\circ}$ evaporation method with electron beam system. The uniform vertical LC alignment on. the SiOx thin film surfaces with electron beam evaporation was achieved. It is considered that the LC alignment on SiOx thin film by $45^{\circ}$ electron beam evaporation is attributed to elastic interaction between LC molecules and micro-grooves at the SiOx thin film surface created by evaporation. The pretilt angles of about $3.5^{\circ}$ in aligned NLC on SiOx thin film surfaces by electron beam evaporation of $45^{\circ}$ were measured. Consequently, the high pretilt angles of the NLC on the SiOx thin film by $45^{\circ}$ oblique electron beam evaporation method can be achieved.

Direct Patterning of Self Assembled Nano-Structures of Block Copolymers via Electron Beam Lithography

  • Yoon Bo Kyung;Hwang Wonseok;Park Youn Jung;Hwang Jiyoung;Park Cheolmin;Chang Joonyeon
    • Macromolecular research
    • /
    • v.13 no.5
    • /
    • pp.435-440
    • /
    • 2005
  • This study describes a method where the match of two different length scales, i.e., the patterns from self-assembled block copolymer (<50 nm) and electron beam writing (>50 nm), allow the nanometer scale pattern mask. The method is based on using block copolymers containing a poly(methyl methacrylate) (PMMA) block, which is subject to be decomposed under an electron beam, as a pattern resist for electron beam lithography. Electron beam on self assembled block copolymer thin film selectively etches PMMA microdomains, giving rise to a polymeric nano-pattern mask on which subsequent evaporation of chromium produces the arrays of Cr nanoparticles followed by lifting off the mask. Furthermore, electron beam lithography was performed on the micropatterned block copolymer film fabricated by micro-imprinting, leading to a hierarchical self assembled pattern where a broad range of length scales was effectively assembled, ranging from several tens of nanometers, through submicrons, to a few microns.

Analysis of machining characteristics of thermogravimetric analysis and high-power density electron beam through the development of vaporized amplification sheets according to metal powder (Metal Powder에 따른 증기화 증폭 시트의 개발을 통한 열 중량 분석 및 고출력 전자빔의 가공 특성 분석)

  • Kim, Hyun-Jeong;Jung, Sung-Taek;Lee, Joo-Hyung;Baek, Seung-Yub
    • Journal of the Korea Society of Die & Mold Engineering
    • /
    • v.14 no.1
    • /
    • pp.56-62
    • /
    • 2020
  • An electron beam was used to mainly utilize for polishing, finishing, welding, a lithography process, etc. Due to the high technical level of difficulty of high-power density electron beam, it is difficult to secure related technologies. In this study, research was carried out to improve the machinability by developing the vaporized amplification sheets to realize the electron beam drilling technology. Their vaporized amplification sheets were analyzed by using the measurement of chemical and composition, which is such as TGA, SEM. We analyzed micro-hole processing using a microscope. Also, the thermal characteristics of vaporized amplification sheets are highly significant for applying to high-power density electron beam technique. So, we finished the vaporized amplification sheets according to the process conditions and analyzed it according to the machining conditions of the electron beam. It was confirmed that the effect on the experimental results differs depending on the influence of the metal powder contained in the developed material.

  • PDF

Radiotherapy Treatment Planning using Computed Tomography in Breast Cancer (유방암에서 CT planning를 이용한 치료계획)

  • 김성규;신세원;김명세
    • Progress in Medical Physics
    • /
    • v.3 no.2
    • /
    • pp.59-65
    • /
    • 1992
  • Carcimoma of the breast are first frequency malignancy in women in the world. third frequency in Korea. Radiation therapy in breast cancer were treated through opposed tangential fields with photon beam or electron beam. Density within the field and thickness to tumor are very importent factors determining dose distribution in radiation therapy of electron beam. Radiotherapy traetment planning using computed tomography in Breast cancer are able to ideal dose distribution. Authors concluded as following. 6MeV energy of electron beam propered below 1.5cm in chest wall's thickness or internal mammary lymphnode's depth. 9MeV energy of electron beam from 1.5cm to 2.0cm. 12 MeV energy of electron beam from 2.0cm to 2.5cm.

  • PDF

Transmission Electron Microscope Specimen Preparation of Si-Based Anode Materials for Li-Ion Battery by Using Focused Ion Beam and Ultramicrotome

  • Chae, Jeong Eun;Yang, Jun Mo;Kim, Sung Soo;Park, Ju Cheol
    • Applied Microscopy
    • /
    • v.48 no.2
    • /
    • pp.49-53
    • /
    • 2018
  • A successful transmission electron microscope (TEM) analysis is closely related to the preparation of the TEM specimen and should be followed by the suitable TEM specimen preparation depending on the purpose of analysis and the subject materials. In the case of the Si-based anode material, lithium atoms of formed Li silicide were removed due to ion beam and electron beam during TEM specimen preparation and TEM observation. To overcome the problem, we proposed a new technique to make a TEM specimen without the ion beam damage. In this study, two types of test specimens from the Si-based anode material of Li-ion battery were prepared by respectively adopting the only focused ion beam (FIB) method and the new FIB-ultramicrotome method. TEM analyses of two samples were conducted to compare the Ga ion damage of the test specimen.

Development and Evaluation of an Electron Beam Source for Microscopy and Its Applications

  • Ahn, Seung-Joon;Oh, Tae-Sik;Kim, Ho-Seob;Ahn, Seong-Joon
    • Journal of the Optical Society of Korea
    • /
    • v.14 no.2
    • /
    • pp.127-130
    • /
    • 2010
  • We have developed an efficient electron beam (e-beam) source, a microcolumn, that can be used as a source module for of microscopy and its applications. To obtain a low operating voltage, a very sharp cold field electron emitter was developed by electrochemically etching a tungsten wire. Laser diffraction was used for the fabrication of high-quality electron lenses and for their precise alignment. The measurement of the e-beam currents, and SEM images captured by the microcolumn confirmed the potential of the device as a very good e-beam source.