• Title, Summary, Keyword: Electron Beam

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Performance Experiment of Electron Beam Convergence Instrument (Finishing 용 전자빔 집속 장치의 성능 실험)

  • Lim, Sun Jong
    • Journal of Korean Society of Laser Processing
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    • v.18 no.3
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    • pp.6-8
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    • 2015
  • Finishing process includes deburring, polishing and edge radiusing. It improves the surface profile of specimen and eliminates the alien substance on surface. Deburring is the elimination process for debris of edges. Polishing lubricates surfaces by rubbing or chemical treatment. There are two types for electron finishing. The one is using pulse beam. The other is using the convergent and scanning electron beam. Pulse type device appropriates the large area process. But it does not control the beam dosage. Scanning type device has advantages for dosage control and edge deburring. We design the convergence and scan type. It has magnetic lenses for convergence and scan device for scanning beam. Magnetic lenses consist of convergent and objective lens. The lenses are designed by the specification(beam size and working distance). In this paper, we evaluate the convergence performance by pattern process. Also, we analysis the results and important factors for process. The important factors for process are beam size, pressure, stage speed and vacuum. These results will be utilized into systematizing pattern shape and the factors.

Study on The Electron-Beam Optics in The Micro-Column for The Multi-Beam Lithography (다중빔 리소그래피를 위한 초소형 컬럼의 전자빔 광학 해석에 관한 연구)

  • Lee, Eung-Ki
    • Journal of the Semiconductor & Display Technology
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    • v.8 no.4
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    • pp.43-48
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    • 2009
  • The aim of this paper is to describe the development of the electron-beam optic analysis algorithm for simulating the e-beam behavior concerned with electrostatic lenses and their focal properties in the micro-column of the multi-beam lithography system. The electrostatic lens consists of an array of electrodes held at different potentials. The electrostatic lens, the so-called einzel lens, which is composed of three electrodes, is used to focus the electron beam by adjusting the voltages of the electrodes. The optics of an electron beam penetrating a region of an electric field is similar to the situation in light optics. The electron is accelerated or decelerated, and the trajectory depends on the angle of incidence with respect to the equi-potential surfaces of the field. The performance parameters, such as the working distances and the beam diameters are obtained by the computational simulations as a function of the focusing voltages of the einzel lens electrodes. Based on the developed simulation algorithm, the high performance of the micro-column can be achieved through optimized control of the einzel lens.

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Transmission Electron Microscopy Specimen Preparation for Two Dimensional Material Using Electron Beam Induced Deposition of a Protective Layer in the Focused Ion Beam Method

  • An, Byeong-Seon;Shin, Yeon Ju;Ju, Jae-Seon;Yang, Cheol-Woong
    • Applied Microscopy
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    • v.48 no.4
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    • pp.122-125
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    • 2018
  • The focused ion beam (FIB) method is widely used to prepare specimens for observation by transmission electron microscopy (TEM), which offers a wide variety of imaging and analytical techniques. TEM has played a significant role in material investigation. However, the FIB method induces amorphization due to bombardment with the high-energy gallium ($Ga^+$) ion beam. To solve this problem, electron beam induced deposition (EBID) is used to form a protective layer to prevent damage to the specimen surface. In this study, we introduce an optimized TEM specimen preparation procedure by comparing the EBID of carbon and tungsten as protective layers in FIB. The selection of appropriate EBID conditions for preparing specimens for TEM analysis is described in detail.

Finite Element Analysis of Large-Electron-Beam Polishing-Induced Temperature Distribution (대면적 전자빔 폴리싱 공정 시 발생하는 온도 분포 유한요소해석 연구)

  • Kim, J.S.;Kim, J.S.;Kang, E.G.;Lee, S.W.;Park, H.W.
    • Journal of The Korean Society of Manufacturing Technology Engineers
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    • v.22 no.6
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    • pp.931-936
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    • 2013
  • Recently, the use of large-electron-beam polishing for polishing complex metal surfaces has been proposed. In this study, the temperature induced by a large electron beam was predicted using the heat transfer theory. A finite element (FE) model of a continuous wave (CW) electron beam was constructed assuming Gaussian distribution. The temperature distribution and melting depth of an SUS304 sample were predicted by changing electron-beam polishing process parameters such as energy density and beam velocity. The results obtained using the developed FE model were compared with experimental results for verifying the melting depth prediction capability of the developed FE model.

Focused Electron Beam-Controlled Graphene Field-Effect Transistor

  • Kim, Songkil
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.33 no.5
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    • pp.360-366
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    • 2020
  • Focused electron beams with high energy acceleration are versatile probes. Focused electron beams can be used for high-resolution imaging and multi-mode nanofabrication, in combination with, molecular precursor delivery, in an electron microscopy environment. A high degree of control with atomic-to-microscale resolution, a focused electron beam allows for precise engineering of a graphene-based field-effect transistor (FET). In this study, the effect of electron irradiation on a graphene FET was systematically investigated. A separate evaluation of the electron beam induced transport properties at the graphene channel and the graphene-metal contacts was conducted. This provided on-demand strategies for tuning transfer characteristics of graphene FETs by focused electron beam irradiation.

Synthesis of Nickel Nanoparticles using Electron Beam Irradiation

  • Lee, Seung Jun;Kim, Hyun Bin;Oh, Seung Hwan;Kang, Phil Hyun
    • Journal of Magnetics
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    • v.20 no.3
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    • pp.241-245
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    • 2015
  • A study on the preparation of nickel oxide nanoparticles using electron beam irradiation is described. Nickel nanoparticles were synthesized with nickel chloride hexahydrate as a metal precursor and different sodium hydroxide concentrations using electron beam irradiation. The effects of sodium hydroxide concentration and electron beam absorbed doses were investigated. The samples were synthesized at different sodium hydroxide concentrations and with absorbed doses of 100 to 500 kGy at room temperature. Synthesized nanoparticles were characterized by X-ray diffraction (XRD) and field emission scanning electron microscopy (FE-SEM) and a vibrating sample magnetometer (VSM). The nanoparticle morphologies seemed to be non-spherical and aggregated. The 1:1 molar ratio of nickel chloride hexahydrate and sodium hydroxide showed a higher purity and saturation magnetization value of 13.0 emu/g. The electron beam absorbed dose was increased with increasing nickel nanoparticle nucleation.

Stabilization of PAN Nanofibers Using Electron Beam Irradiation and Thermal Compression Technique (전자선 조사와 열압축공정을 이용한 PAN 나노섬유의 안정화 및 특성분석)

  • Kim, Du Yeong;Jeun, Joon Pyo;Shin, Hye Kyoung;Kang, Phil Hyun
    • Journal of Radiation Industry
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    • v.6 no.1
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    • pp.55-59
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    • 2012
  • Polyacrylonitrile (PAN)-based carbon fibers have been widely used due to their unique chemical, electrical, and mechanical properties. Electron beam irradiation has been extensively employed as means of altering properties of polymeric materials. Electron beam irradiation can induce chemical reactions in materials without any catalyst. Electron beam irradiation may be useful in accelerating the thermal compression stabilization of PAN nanofibers. To investigate the irradiation effect on PAN fibers, PAN nanofibers were irradiated by electron beam at 1,000~5,000 kGy. Irradiated and non-irradiated PAN nanofibers were heated at 180 and $220^{\circ}C$ without applying pressure for 15 min. Then 1 metric ton has been applied for 5 min. SEM images have been found that the fiber kept its morphological behavior after the hot pressing up to electron beam irradiated 1,000 kGy. DSC thermograms showed that the peak temperatures of the exothermic reactions were found to decrease with increasing electron beam irradiation doses and temperature. FT-IR spectra have been found to decrease $C{\equiv}N$ stretch band with increasing the electron beam irradiation dose. These results indicate that the modification of PAN via reactions such as cyclization is significantly enhanced by electron beam irradiation and thermal compression technique.

The Effects of Electron Beam Exposure Time on Transmission Electron Microscopy Imaging of Negatively Stained Biological Samples

  • Kim, Kyumin;Chung, Jeong Min;Lee, Sangmin;Jung, Hyun Suk
    • Applied Microscopy
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    • v.45 no.3
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    • pp.150-154
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    • 2015
  • Negative staining electron microscopy facilitates the visualization of small bio-materials such as proteins; thus, many electron microscopists have used this conventional method to visualize the morphologies and structures of biological materials. To achieve sufficient contrast of the materials, a number of imaging parameters must be considered. Here, we examined the effects of one of the fundamental imaging parameters, electron beam exposure time, on electron densities generated using transmission electron microscopy. A single site of a negatively stained biological sample was illuminated with the electron beam for different times (1, 2, or 4 seconds) and sets of micrographs were collected. Computational image processing demonstrated that longer exposure times provide better electron densities at the molecular level. This report describes technical procedures for testing parameters that allow enhanced evaluations of the densities of electron microscopy images.

Establishment of Column Unit for Electron Beam Machining System (전자빔 가공시스템용 경통의 구축)

  • 강재훈;이찬홍;최종호
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • pp.1017-1020
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    • 2004
  • It is not efficient and scarcely out of the question to use commercial expensive electron beam lithography system widely used for semiconductor fabrication process for the manufacturing application field of various devices in the small business scope. Then scanning electron microscope based electron beam machining system is maybe regarded as a powerful model can be used for it simply. To get a complete suite of thus proper system, column unit build up with several electo-magnetic lens is necessarily required more than anything else to modify scanning electron microscope. In this study, various components included several electro-magnetic lens and main body which are essentially constructed for column unit are designed and manufactured. And this established column unit will be used for next connected study in the development step of scanning electron microscope based electron beam machining system.

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Improved Electrical and Optical Properties of ITO Films by Using Electron Beam Irradiated Sputter

  • Wie, Sung Min;Kwak, Joon Seop
    • Proceedings of the Korean Vacuum Society Conference
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    • pp.407-408
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    • 2013
  • Thin transparent conductive oxides (TCOs) having a thickness lower than 30 nm have been widely usedin touch screen panels. However the resistivity of the TCO films significantly increases as the thickness decreases, due to the poor crystallinity at very thin thickness of TCO films. In this study, we have investigated the effect of electron beam irradiation during the sputtering on the electrical properties and transmittance of 30 nm-thick ITO films, which have a different SnO2 atomic percent, prepared by magnetron sputtering at room temperature. Fig. 1 shows the variation of resistivity of ITO films with a different SnO2 atomic percent for both the normal ITO films and electron beam irradiated ITO films. As shows in Fig. 1, the electron beam irradiation to the ITO (SnO2 weight percent 10%) films during the sputtering resulted in a significantly decreased in resistivity from $7.4{\times}10^{-4}{\Omega}-cm$ to $1.5{\times}10^{-4}{\Omega}-cm$ and it also increased in transmittance from 84% to 88% at a wavelength of 550 nm. These results can be attributed to energy transfer from electron to ad-atoms of ITO films during the electron beam irradiated sputtering, which can enhance the crystallinity of 30 nm-thick ITO films. It is strongly indicate that electron beam irradiation can greatly improve the electrical properties and transmittance of very thin ITO films for touch screen panels, flexible displays and solar cells.

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