• Title, Summary, Keyword: Electron Beam

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A New Trend of In-situ Electron Microscopy with Ion and Electron Beam Nano-Fabrication

  • Furuya, Kazuo;Tanaka, Miyoko
    • Applied Microscopy
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    • v.36 no.spc1
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    • pp.25-33
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    • 2006
  • Nanofabrication with finely focused ion and electron beams is reviewed, and position and size controlled fabrication of nano-metals and -semiconductors is demonstrated. A focused ion beam (FIB) interface attached to a column of 200keV transmission electron microscope (TEM) was developed. Parallel lines and dots arrays were patterned on GaAs, Si and $SiO_2$ substrates with a 25keV $Ga^+-FIB$ of 200nm beam diameter at room temperature. FIB nanofabrication to semiconductor specimens caused amorphization and Ga injection. For the electron beam induced chemical vapor deposition (EBI-CVD), we have discovered that nano-metal dots are formed depending upon the beam diameter and the exposure time when decomposable gases such as $W(CO)_6$ were introduced at the beam irradiated areas. The diameter of the dots was reduced to less than 2.0nm with the UHV-FE-TEM, while those were limited to about 15nm in diameter with the FE-SEM. Self-standing 3D nanostructures were also successfully fabricated.

Operating System Design of Multi Beam Control System with Miniaturized Electron Beam Columns (초소형 전자빔을 이용한 멀티 전자빔 운영 시스템 설계)

  • Lim, Sun Jong;Kim, Ho Seob
    • Journal of Korean Society of Laser Processing
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    • v.18 no.4
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    • pp.12-16
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    • 2015
  • The research on multi electron beam systems is being carried out by various methods. We are studying multi electron beam system using miniaturized electron beam columns. The column consists of electrostatic lenses, electrostatic deflector and tip emitter. Our operating system controls 4 column array, captures images of each column and maintains the instrument. We present the usefulness of our operating system for multi columns by capturing images of each column.

Characteristics of spatial distribution of cold cathode type large aperture electron beam (냉음극형 대면적 전자빔의 공간적 분포 특성)

  • Woo, S.H.;Abroyan, M.;Cho, C.H.;Kim, G.H.;Lee, H.S.;Rim, G.H.;Lee, K.S.
    • Proceedings of the KIEE Conference
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    • pp.2170-2172
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    • 1999
  • A low energy large aperture(LELA) pulsed electron beam generator of a cold cathode type has been developed for environmental applications, for example, waste water cleaning, flue gas cleaning, and pasteurization etc. The operational principle is based on the emission of secondary electrons from cold cathode when ions in the plasma hit the cathode, which are accelerated toward exit window by the gradient of an electric potential. We have fabricated the LELA electron beam generator with the peak energy of 200keV and beam diameter of 200mm and obtained the large aperture electron beam in air. The electron beam current density has been investigated as a function of glow discharge current, accelerating voltage and radial distribution in front of the exit window foil. The plasma density and electron temperature have been measured in order to confirm the relation with the electron beam current density. We are going to upgrade the LELA electron beam generator in the electron energy, electron beam current and stability of operation for various applications.

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Development of Intelligent Remote Beam Control Function in E-Beam Manufacturing System (전자빔 가공기의 지능형 원격 빔 조절 기능의 개발)

  • Lim Sun-Jong;Lyou Joon
    • Transactions of the Korean Society of Machine Tool Engineers
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    • v.15 no.2
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    • pp.24-29
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    • 2006
  • The use electron-beam(E-beam) manufacturing system provides a means to alleviate optic exposure equipment's problems. We are developing an E-beam manufacturing system with scanning electron microscope(SEM) function. The E-beam manufacturing system consist of high voltage generator, beam blanker, condenser lenses, object lenses, stigmator and stage. The development of E-beam manufacturing system is used on the method of remaking SEM's structure. The functions of SEM are developed. It is important for the test of E-beam performance. In E-beam manufacturing system and SEM, beam focus is important function. In this paper, we propose intelligent remote control function for beam focus in E-beam manufacturing system. The function extends the user's function and gives convenience.

A Study on Electric Characteristics of Plasma Electon Beam Produced by Cold Cathode. (냉음극을 이용한 plasma전자 beam의 전기적 입력특성 I)

  • 전춘생;박용관
    • 전기의세계
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    • v.27 no.3
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    • pp.36-42
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    • 1978
  • It has been investigates that electric characteristics of plasma electron beam in N$_{2}$, H$_{2}$ and Ar gas jars under various gas pressures during electron beams are formed. The results are as follows: 1)Electron beam is formed in the region of positive resistance on the characteristic curve. This phenomenon is identical in N$_{2}$, H$_{2}$ and Ar gases. 2)But in Ar gas, electron beam is formed at relatively lower gas pressure than in H$_{2}$ and N$_{2}$. 3)In pure gas either N$_{2}$, H$_{2}$ and N$_{2}$ the lower the gas pressure, the higher the voltage drop for the same electron beam current. 4)The region in which electron beam is formed is limited at a given pressure. 5)Beyond the limit mentioned above, it becomes glow discharge state and the current increases radically. 6)At a given gas pressure, electron beam voltage, that is, electrical power input increases with gap length.

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Fabrication of carbon nanotube electron beam (C-beam) for thin film modification

  • Kang, Jung Su;Lee, Su Woong;Lee, Ha Rim;Chung, Min Tae;Park, Kyu Chang
    • Proceedings of the Korean Vacuum Society Conference
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    • pp.171.1-171.1
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    • 2015
  • Carbon nanotube emitters is very promising electron emitter for electron beam applications. We introduced the carbon nanotube electron beam (C-beam) exposure technic using triode structure. As a source, the electron beam emit from CNT emitters placed at the cathode by high electric field. Through the gate mesh, with high accelerating energy, the electron can be extracted easily and impact at the anode plate. For thin film modification, after the C-beam exposure on the amorphous silicon thin film, we found phase changes and it showed a high crystallinity from the Raman measurement. We expect that this crystallized film will be a good candidate as a new active layer of TFT.

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Effect of the Off-axis distance of the Electron Emitting Source in Micro-column (마이크로 칼럼의 전자 방출원 위치 오차의 영향)

  • Lee, Eung-Ki
    • Journal of the Semiconductor & Display Technology
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    • v.9 no.1
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    • pp.17-21
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    • 2010
  • Currently miniaturized electron-optical columns find their way into electron beam lithography systems. For better lithography process, it is required to make smaller spot size and longer working distance. But, the micro-columns of the multi-beam lithography system suffer from chromatic and spherical aberration, even when the electron beam is exactly on the symmetric axis of the micro-column. The off-axis error of the electron emitting source is expected to become worse with increasing off-axis distance of the focusing spot. Especially the electron beams far from the system optical axis have a non-negligible asymmetric intensity distribution in the micro-column. In this paper, the effect of the off-axis e-beam source is analyzed. To analyze this effect is to introduce a micro-column model of which the e-beam emitting source is aligned with the center of the electron beam by shifting them perpendicular to the system optical axis. The presented solution can be used to analysis the performance of the multi-electron-beam system. The performance parameters, such as the working distances and the focusing position are obtained by the computational simulations as a function of the off-axis distance of the emitting source.

OPTIMIZATION OF OPERATION PARAMETERS OF 80-KEV ELECTRON GUN

  • Kim, Jeong Dong;Lee, Yongdeok;Kang, Heung Sik
    • Nuclear Engineering and Technology
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    • v.46 no.3
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    • pp.387-394
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    • 2014
  • A Slowing Down Time Spectrometer (SDTS) system is a highly efficient technique for isotopic nuclear material content analysis. SDTS technology has been used to analyze spent nuclear fuel and the pyro-processing of spent fuel. SDTS requires an external neutron source to induce the isotopic fissile fission. A high intensity neutron source is required to ensure a high for a good fissile fission. The electron linear accelerator system was selected to generate proper source neutrons efficiently. As a first step, the electron generator of an 80-keV electron gun was manufactured. In order to produce the high beam power from electron linear accelerator, a proper beam current is required form the electron generator. In this study, the beam current was measured by evaluating the performance of the electron generator. The beam current was determined by five parameters: high voltage at the electron gun, cathode voltage, pulse width, pulse amplitude, and bias voltage at the grid. From the experimental results under optimal conditions, the high voltage was determined to be 80 kV, the pulse width was 500 ns, and the cathode voltage was from 4.2 V to 4.6 V. The beam current was measured as 1.9 A at maximum. These results satisfy the beam current required for the operation of an electron linear accelerator.

Study on Characteristics of Dose Distribution in Tissue of High Energy Electron Beam for Radiation Therapy (방사선 치료용 고에너지 전자선의 조직 내 선량분포 특성에 관한 연구)

  • Na, Soo-Kyung
    • The Journal of Korean Society for Radiation Therapy
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    • v.14 no.1
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    • pp.175-186
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    • 2002
  • The purpose of this study is directly measure and evaluate about absorbed dose change according to nominal energy and electron cone or medical accelerator on isodose curve, percentage depth dose, contaminated X-ray, inhomogeneous tissue, oblique surface and irradiation on intracavitary that electron beam with high energy distributed in tissue, and it settled standard data of hish energy electron beam treatment, and offer to exactly data for new dote distribution modeling study based on experimental resuls and theory. Electron beam with hish energy of $6{\sim}20$ MeV is used that generated from medical linear accelerator (Clinac 2100C/D, Varian) for the experiment, andwater phantom and Farmer chamber md Markus chamber und for absorbe d dose measurement of electron beam, and standard absorbed dose is calculated by standard measurements of International Atomic Energy Agency(IAEA) TRS 277. Dose analyzer (700i dose distribution analyzer, Wellhofer), film (X-OmatV, Kodak), external cone, intracavitary cone, cork, animal compact bone and air were used for don distribution measurement. As the results of absorbed dose ratio increased while irradiation field was increased, it appeared maximum at some irradiation field size and decreased though irradiation field size was more increased, and it decreased greatly while energy of electron beam was increased, and scattered dose on wall of electron cone was the cause. In percentage depth dose curve of electron beam, Effective depth dose(R80) for nominal energy of 6, 9, 12, 16 and 20 MeV are 1.85, 2.93, 4.07, 5.37 and 6.53 cm respectively, which seems to be one third of electron beam energy (MeV). Contaminated X-ray was generated from interaction between electron beam with high energy and material, and it was about $0.3{\sim}2.3\%$ of maximum dose and increased with increasing energy. Change of depth dose ratio of electron beam was compared with theory by Monte Carlo simulation, and calculation and measured value by Pencil beam model reciprocally, and percentage depth dose and measured value by Pencil beam were agreed almost, however, there were a little lack on build up area and error increased in pendulum and multi treatment since there was no contaminated X-ray part. Percentage depth dose calculated by Monte Carlo simulation appeared to be less from all part except maximum dose area from the curve. The change of percentage depth dose by inhomogeneous tissue, maximum range after penetration the 1 cm bone was moved 1 cm toward to surface then polystyrene phantom. In case of 1 cm and 2 cm cork, it was moved 0.5 cm and 1 cm toward to depth, respectively. In case of air, practical range was extended toward depth without energy loss. Irradiation on intracavitary is using straight and beveled type cones of 2.5, 3.0, 3.5 $cm{\phi}$, and maximum and effective $80\%$ dose depth increases while electron beam energy and size of electron cone increase. In case of contaminated X-ray, as the energy increase, straight type cones were more highly appeared then beveled type. The output factor of intracavitary small field electron cone was $15{\sim}86\%$ of standard external electron cone($15{\times}15cm^2$) and straight type was slightly higher then beveled type.

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