• Title, Summary, Keyword: Co-Cr 박막

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The Effect of Si Underlayer on the Magnetic Properties and Crystallographic Orientatation of CoCr(Mo) Thin Film (CoCr(Mo) 박막의 자기적 특성 및 미세구조에 미치는 Si 하지층의 영향)

  • 이호섭;남인탁
    • Journal of the Korean Magnetics Society
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    • v.9 no.5
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    • pp.256-262
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    • 1999
  • Sputter deposited CoCr(Mo)/Si film were studied with emphasis on the correlation between magnetic properties and crystallographic orientation. The perpendicular coercivities of CoCr films decreased with Si underlayer thickness, whereas those of CoCrMo films increased with Si underlayer thickness. It has been explained that additions of the larger atomic radius Mo atoms in CoCr films impedes crystal growth resulting in a decrease in grain size, thus this small grain size may induce high perpendicular coercivity. The c-axis alignment of CoCrMo film was improved due to addition of 2at.%Mo. It means CoCrMo layer grow self-epitaxial directly from orientation and structure of Si underlayer when the main layer grow on underlayer.

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A Study on the Magnetic Anisotropy of Co-Cr-(Ta) Thin Films for Perpendicular Magnetic Recording (Co-Cr-(Ta) 수직자기기록용 박막의 자기이방성에 대한 연구)

  • 황충호;박용수;신경호;이택동
    • Journal of the Korean Magnetics Society
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    • v.3 no.3
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    • pp.208-214
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    • 1993
  • In order to investigate the origin of an increase in the coercivity with the Ta addition to Co-Cr films, the perpendicular magnetic anisotropy of Co-Cr film and CoCrTa film was measured by a torque magnetometer and VSM. In Co-Cr binary alloy film, the uniaxial anisotropy increased with increasing Cr content. The perpendicular magnetic anisotropy of $Co_{81.7}Cr_{16.7}Ta_{1.6}$ film was larger than that of $Co_{81}Cr_{19}$ film, both of which were deposited at the same substrate temperature of $100^{\circ}C$. The change in the perpendicular magnetic anisotropy with annealing was studied to understand the Ta addition effect. The amount of decrease in perpendicular magnetic anisotropy of the CoCrTa film by the annealing was larger than that of Co-Cr film. And the perpendicular magnetic anisotripies of Co-Cr film and CoCrTa film after annealing were almost the same. The cause of this was interpretated as the enhanced segregation of solute atoms in the Ta added thin film in the as-deposited state. The enhanced segregation of solute atoms increases the perpendicular magnetic anisotropy of the film, and causes the increase of perpendicular coercivity of the film.

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A Study on Corrosion CoCrMo Magnetic Thin Films (CoCrMo 자성박막의 부식에 관한 연구)

  • 남인탁;홍양기
    • Journal of the Korean Magnetics Society
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    • v.3 no.3
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    • pp.221-228
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    • 1993
  • The general requirements of recording media include recording performance, environmental stability, runnability on the drive or deck, and manufacturability. CoCrMo thin films were prepared using RF sputtering system for a study on chemical stability. Surface degradation of the CoCrMo thin film was studied by SEM, XPS and AES. Surface degradation was found to be dependent of sputtering condition and Mo content. Addition of Mo to CoCr thin film improved dramatically its surface degradation resistance in dilute sulfuric acid, as indicated by active-passive transition appeared in electrochemical polarization curve. Futhermore, the passive current density was decreased with increasing Mo content. The reduction in a number density of corrosion sites by Mo addition vms observed, after accelerated corrosion test. AES survey indicated that corrosion occured on the site with Cr depletion and highly concentrated chloride ions.

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A Study of Relationship between Magnetic Properties and Microstructure of CoNiCr/Cr Double Layer Thin Film Magnetic Recording Media (자기기록매체 CoNiCr/Cr 이중박막의 자기적 성질과 미세구조와의 관계연구)

  • 김희삼;남인탁;홍양기
    • Journal of the Korean Magnetics Society
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    • v.3 no.3
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    • pp.215-220
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    • 1993
  • Microstructural dependence of magnetic property of RF/DC sputtered $Co_{69.0}Ni_{18.5}Cr_{12.5}/Cr$ double layer thin film was studied. Grain size was found to be decreased with substrate temperature in the range of $100-200^{\circ}C$ and Cr underlayer thickness(from $500\;{\AA}-2000\;{\AA}$). The peaks (200) and (1120) of X-ray diffraction patterns were evidently grown with the substrate temperature for the Cr underlayer and magnetic layer, respectively. The CoNiCr magnetic layer was found to be well epitaxialy grown on Cr underlayer, and subsequently the coercivity was enhanced.

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Effect of $Co_{73}Cr_{27}$ Seed Layer on the Crystalline Alignment and Microstructure in CoCr Thin Films ($Co_{73}Cr_{27}$ 씨앗층이 CoCr 박막의 결정배향성 및 미세구조에 미치는 영향)

  • 이유기;이택동
    • Journal of the Korean Vacuum Society
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    • v.3 no.1
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    • pp.45-50
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    • 1994
  • CoCr 박막에 있어서 C축 결정배향성과 미세구조 변화에 대한 Co73Cr27 씨앗층의 영향이 조사되 었다. 기록밀도가 높고 재생전압도 높은 CoCr 수직기록매체를 개발하기 위해서는 CoCr층의 두께가 엷 으면서 결정배향성이 우수하고 결정립 크기가 적고 균일한 자성기록막 제조가 필요하다. CoCr 단층막 또는 CoCr/퍼말로이 이중막 제조에서 500$\AA$정도의 Co73Cr27 층을 씨앗층으로 만들어 줌으러써 기록층인 CoCr 박막이 $0.2mu$m의 두께에서도 천이층이 거의 없고 결정배향성이 우수한 자성막을 제조할 수 있었 다. 또한 Co73Cr27 씨앗층은 비록 결정립 크기는 증가시켰지만 기록층의 에피택시 성장에 보다 바람직 한 것으로 조사되었다.

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Effects of Mo and Si on the Coercivity of CoCrTa/CrMo and CoCrTa/CrSi Thin Film Media (CoCrTa/CrX (X=Mo, Si) 자성박막의 보자력에 미치는 Mo와 Si의 영향)

  • 조준식;남인탁;홍양기
    • Journal of the Korean Magnetics Society
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    • v.9 no.4
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    • pp.203-209
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    • 1999
  • Effects of Mo and Si addition in Cr underlayer on magnetic properties of CoCrTa/CrMo and CoCrTa/Si thin films media were investigated. Thin films were prepared with DC magnetron sputtering system. The thickness of CoCrTa magnetic layer and Cr underlayer were fixed at 300 $\AA$ and 700 $\AA$, respectively. The substrate heating temperature was kept constant at 26$0^{\circ}C$ for both magnetic layer and underlayer preparation. The coercivity increase of CoCrTa film was realized due to Mo addition in Cr underlayer. Si addition made a small decrease in coercivity. Coercivity increase seems to be attributed by the improvement of preferred orientation of Cr(200) plane. It is found that lattice fit between Cr(200) and CoCrTa(1120) of CrMo underlayer is better than that of CrSi underlayer. This small misfit may also contribute coercivity increase.

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Magnetic properties due to variation of microstructure of Co-Cr thin films (Co-Cr 박막의 미세구조 변화에 따른 자기적 특성)

  • 김경환;손인환
    • Journal of the Korean Vacuum Society
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    • v.8 no.1
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    • pp.26-30
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    • 1999
  • Sputter deposited Co-Cr thin films been developed continuously as one of the major candidates for high density recording media. In this study, Co-26at%Cr thin films with c-axis oriented normal to substrate surface were prepared by a improved facing targets sputtering system. We find that the effect of microstructural changes of the sputtered Co-Cr thin films on magnetic properties and changes of crystal orientation due to the variation of substrate temperature.

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Underlayer for Coercivity Enhancement of Ti/CoCrPt Thin Films (보자력 향상을 위한 Ti/CoCrPt박막의 하지층)

  • Jang, Pyung-Woo
    • Journal of the Korean Magnetics Society
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    • v.12 no.3
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    • pp.94-98
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    • 2002
  • Sputtering conditions and various underlayer such as Al, Cu, Ni, Cr, Ag, Mg, Fe, Co, Pd, Au, Pt, Mo and Hf were investigated for coercivity enhancement of 20 nm Ti/CoCrPt thin films in order to increase the coercivity of the films thinner than 20 nm. Among them, Ag and Mg were effective to increase the coercivity. Particularly 2 nm Ag was very effective to increase the coercivity and nucleation field as well as to reduce ${\alpha}$ value in CoCrPt thin film such that the coercivity of 2 nm Ag/18 nm Ti/10 nm CoCrPt film was 2200 Oe. However, it seemed that other coercivity enhancement mechanism operated in CoCrPt films because Ti (002) preferred texture was not developed with Ag underlayer contrary to a general expectation. And the coercivity and nucleation field were decreased when glass substrate with rougher surface was used.

Magnetic properties of $\textrm{SiO}_2$/CoNiCr/Cr thin films ($\textrm{SiO}_2$/CoNiCr/Cr 합금 박막의 자기적 성질)

  • Kim, Taek-Su;Kim, Jong-O;Seo, Gyeong-Su
    • Korean Journal of Materials Research
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    • v.7 no.1
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    • pp.69-75
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    • 1997
  • Thin films of $Si0_2(1000{\AA})/CoNiCr(400{\AA})/Cr$ were fabricated as a function of Cr thickness by KF magnetron sputtering. The saturation magnetization, coercive force and squareness with annealing temperature for these films were investigated. The values of saturation magnetization of $SiO_2/CoNiCr/Cr$ thin films decreased as the thickness of Cr underlayer increased, whereas coercive force increased as the thickness of Cr underlayer increased. The value of Ms was 600 emu/cc and the maximum value of Hc was 550 Oe. Especially, the value of saturation magnetization was rapidly decreased $SiO_2/CoNiCr/Cr(1700{\AA})$ thin films as the annealing temperature increased And the coercive force increased as the annealing temperature increased When annealing temperature was $650^{\circ}C$, the Ms was reduced to 90 % of the as-deposited film. And the Hc was showed maximum 1600 Oe. It was thought that Cr diffusion into CoNiCr layer reduced the magnetic moment of CoKiCr layer. In addition. Hc might he increased due to grain growth perpendicular to the film plane.

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Magnetic Properties of Co-P and Co-P-Cr Thin Films for Longitudinal Magnetic Recording (수평자기기록용 Co-P, Co-P-Cr 박막의 자기적특성)

  • Pyun-Woo Jang;Hong-Kyun Sohn;Taek-Dong Lee
    • Journal of the Korean Magnetics Society
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    • v.4 no.2
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    • pp.160-167
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    • 1994
  • In order to develop new magnetic media with higher coercivity, we have investigated the magnetic properties of Co-P/Cr and Co-P-Cr/Cr films. The coercivity of Co-P binary films deposited at RT was around 835 Oe in the range of 9-12 at.% P. In the Co-P binary system coercivity decreased with increasing substrate temperature for P contents of 9-12 at.%, which may be due to the decomposition of Co-P single phase to Co and $Co_{2}P$ phase. However, the coercivity of the films containing more than 12 at.% P is very low due to the formation of amorphous phase. The coercivity of Co-P-Cr ternary films increased with increasing Cr contents and reached the maximum value of 1020 Oe in the water $Co_{84}P_{10}Cr_{6}$ Film.

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