• Title/Summary/Keyword: 자외선 반응기

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Seawater Treatment depending on Configuration of UV Chambers (자외선 반응기의 구성에 따른 해수처리)

  • Choi, Yong-Ki;Park, Dae-Won;Kim, Il-Kwon;Lee, Jung-Yoon;Kil, Gyung-Suk;Cheon, Sang-Gyu
    • Proceedings of the Korean Society of Marine Engineers Conference
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    • 2011.06a
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    • pp.190-190
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    • 2011
  • 본 논문에서는 자외선 처리방식의 선박평형수 처리시스템의 최적 설계를 위하여 동일 소비전력에서 살균 챔버의 구성에 따른 해수처리성능에 대하여 기술하였다. 20 W 저압 자외선 램프 9개를 설치한 살균챔버와 10 W 저압 자외선 램프를 18개 사용한 2단 구성의 살균챔버를 사용하여, 15 $m^3$/h로 해수를 처리하고 처리 전후의 해수내 미생물에 대한 처리성능을 비교.분석하였다.

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Study on CFD Methodology for a Open Channel Type UV Reactor (전산유체역학을 활용한 개수로형 UV소독장비의 해석기법 연구)

  • Hwang, Woochul;Bak, Jeong-Gyu;Kim, Hyunsoo;Lee, Kunghyuk;Cho, Jinsoo
    • The KSFM Journal of Fluid Machinery
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    • v.18 no.2
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    • pp.54-59
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    • 2015
  • The performance of UV reactor which is used in water treatment is strongly affected by UV fluence rate and water flow in the UV reactor. Therefore, CFD tools are widely used in designing process of UV reactors. This paper describes the development of a computational fluid dynamics (CFD) methodology that can be used to calculate the performance of open channel type UV reactor used in wastewater treatment plant. All computations were performed using commercial CFD code, CFX, by considering three dimensional, steady, incompressible flow. The Eulerian-Eulerian multi-phase method were used to capture the water-air interface. The MSSS model, provided by UVCalc3D, was used to calculate the UV intensity field. The numerical predictions and calculated UV Dose were compared with experimental dataset to validate the CFD methodology. The reactor performance based on MS2 log reduction was well matched with measurements within 6%.

Evaluation of Hydroxyl radical Formation and Energy Distribution in Photolysis Reactor (광반응 반응기 내부의 에너지 분포와 라디칼 생성에 대한 연구)

  • Nam, Sang-Geon;Hwang, An-Na;Cho, Sang-Hyun;Lim, Myung-Hee;Kim, Jee-Hyeong
    • Journal of the Korean Society of Hazard Mitigation
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    • v.11 no.2
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    • pp.179-183
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    • 2011
  • In this study, photochemical effects (OH radical formation) in the photoreactor was investigated to analyze UV-C intensity distribution. In addition, The influence radius of the UV-C lamp was measured at various dose of $TiO_2$ (Degussa P-25). The photoreactor used in this study was bath type reactor which is made by acrylic and the UV-C lamp (SANKYO DENKI, wavelength : 254 nm, Diameter : 2.2 cm, Length : 18.5 cm) was used as photo source. The maximum electric power consumption of the UV lamp was 10.5 W. The OH radical formation by UV-C was measured by KI dosimetry methods. From the results, the effective OH radical formation was occurred under the following condition. The reasonable distance of UV-C lamp is within 13 cm and the intensity of UV-C lamp should be more than 0.367 mW/$cm^2$. Moreover, the concentration of catalyst affects on the influence radius of the UV lamp.