Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)
- Volume 31 Issue 4
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- Pages.198-202
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- 2018
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- 1226-7945(pISSN)
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- 2288-3258(eISSN)
DOI QR Code
The Electrical Properties of Post-Annealing in Neutron-Irradiated 4H-SiC MOSFETs
중성자 조사한 4H-SiC MOSFET의 열처리에 의한 전기적 특성 변화
-
Lee, Taeseop
(Department of Electronic Materials Engineering, Kwangwoon University) ;
- An, Jae-In (Department of Electronic Materials Engineering, Kwangwoon University) ;
- Kim, So-Mang (Department of Electronic Materials Engineering, Kwangwoon University) ;
- Park, Sung-Joon (Department of Electronic Materials Engineering, Kwangwoon University) ;
- Cho, Seulki (Department of Electronic Materials Engineering, Kwangwoon University) ;
-
Choo, Kee-Nam
(Korea Atomic Energy Research Institute) ;
-
Cho, Man-Soon
(Korea Atomic Energy Research Institute) ;
-
Koo, Sang-Mo
(Department of Electronic Materials Engineering, Kwangwoon University)
-
이태섭
(광운대학교 전자재료공학과) ;
- 안재인 (광운대학교 전자재료공학과) ;
- 김소망 (광운대학교 전자재료공학과) ;
- 박성준 (광운대학교 전자재료공학과) ;
- 조슬기 (광운대학교 전자재료공학과) ;
-
주기남
(한국원자력연구원) ;
-
조만순
(한국원자력연구원) ;
-
구상모
(광운대학교 전자재료공학과)
- Received : 2018.01.18
- Accepted : 2018.02.21
- Published : 2018.05.01
Abstract
In this work, we have investigated the effect of a 30-min thermal anneal at
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Acknowledgement
Supported by : 한국전기연구원, 한국연구재단, 한전 기초전력연구원, 한국산업기술평가관리원(KEIT)
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